Novel class of low molecular-weight organic resists for nanometer lithography

Applied Physics Letters

Volumn 69, Issue 17, 1996, Pages 2605-2607

  Yoshiiwa, Motoko ^a   Kageyama, Hiroshi ^a   Shirota, Yasuhiko ^a   Wakaya, Fujio ^a   Gamo, Kenji ^a   Takai, Mikio ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000274144     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.117714     Document Type: Article

References (11)

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