C60-incorporated nanocomposite resist system for practical nanometer pattern fabrication

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 2570-2574

  Ishii, T ^a   Nozawa, H ^a   Tamamura, T ^a   Ozawa, A ^b  

^a NTT CORPORATION   (Japan)

^b NTT Advanced Technology Corporation   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000882799     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (7)

1. T. Ishii, H. Nozawa, and T. Tamamura, Micro- and Nano-Engineering, Glasgow, Abstract 21 (1996).
2. T. Ishii, H. Nozawa, and T. Tamamura, Appl. Phys. Lett. 70, 1110 (1997).
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5. K. Deguchi, K. Miyoshi, T. Ishii, and T. Matsuda, Jpn. J. Appl. Phys., Part 1 31, 2954 (1992).
6. T. Tanaka, M. Morigami, and N. Atoda, Jpn. J. Appl. Phys., Part 1 32, 6059 (1993).
7. A. Ozawa, S. Ohki, M. Oda, and H. Yoshihara, IEICE Trans. Electron. E77-C(2), 255 (1994).