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Volumn 584, Issue , 2000, Pages 305-312
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Nanoscale electron-beam processes and its application to nanodevices
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Author keywords
[No Author keywords available]
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Indexed keywords
DEPOSITION;
ELECTRIC CONDUCTIVITY;
ELECTRON DEVICES;
FILMS;
HYDROCARBONS;
MOLECULES;
MULTILAYERS;
PHOTORESISTS;
SILICA;
SILICON;
TUNGSTEN COMPOUNDS;
TUNNEL JUNCTIONS;
BARRIER HEIGHT;
LINE EDGE ROUGHNESS;
LOW MOLECULAR WEIGHT RESIST MATERIALS;
NANODEVICES;
SINGLE ELECTRON TRANSISTOR;
TUNNEL RESISTANCES;
ELECTRON BEAM LITHOGRAPHY;
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EID: 0033710292
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Article |
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Times cited : (1)
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References (22)
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