Soft X-rays for deep sub-100 NM lithography, with and without masks

Materials Research Society Symposium - Proceedings

Volumn 584, Issue , 2000, Pages 11-21

  Smith, Henry I ^a   Carter, D J D ^a   Ferrera, J ^a   Gil, D ^a   Goodberlet, J ^a   Hastings, J T ^a   Lim, M H ^a   Meinhold, M ^a   Menon, R ^a   Moon, E E ^a   Ross, C A ^a   Savas, T ^a   Walsh, M ^a   Zhang, F ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; DYNAMIC RANDOM ACCESS STORAGE; ELECTRON BEAM LITHOGRAPHY; MASKS; NANOTECHNOLOGY; SEMICONDUCTOR DEVICE MANUFACTURE;

ZONE PLATE ARRAY LITHOGRAPHY;

X RAY LITHOGRAPHY;

EID: 0033708914     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (37)