Resist materials providing small line-edge roughness

Materials Research Society Symposium - Proceedings

Volumn 584, Issue , 2000, Pages 135-146

  Namatsu, Hideo ^a   Yamaguchi, Toru ^a   Kurihara, Kenji ^a  

^a NTT Basic Research Laboratories   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AGGLOMERATION; DISSOLUTION; ELECTRON BEAM LITHOGRAPHY; EXTRACTION; ORGANIC POLYMERS; SURFACE ROUGHNESS;

ACRYLATE TYPE RESIST; CROSSLINKER; HYDROGEN SILSESQUIOXANE; LINE EDGE ROUGHNESS;

NANOTECHNOLOGY;

EID: 0033709950     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (10)