Nanolithography using fullerene films as an electron beam resist

Journal of Photopolymer Science and Technology

Volumn 10, Issue 4, 1997, Pages 647-650

  Tada, Tetsuya ^a   Kanayama, Toshihiko ^a  

^a NONE

Author keywords

C60; Electron beam resist; Fullerene; Fullerene derivative; Nanolithography

Indexed keywords

EID: 0001149382     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.10.647     Document Type: Article

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