193 nm Single Layer Resist Based on Poly(norbornenealt-maleic anhydride) Derivatives: The Interplay of the Chemical Structure of Components and Lithographic Properties

ACS Symposium Series

Volumn 706, Issue , 1998, Pages 191-207

  Houlihan, F M ^a   Timko, A ^a   Hutton, R ^a   Cirelli, R ^a   Kometani, J M ^a   Reichmanis, Elsa ^a   Nalamasu, O ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0041411816     PISSN: 00976156     EISSN: None     Source Type: Book Series    
DOI: None     Document Type: Article

References (29)

1. For some leading references on 193 nm resists, see: (a) Allen R. D.; Wan I. Y.; Wallraff G. M.; DiPietro R. A.; Hofer D. C.; Kunz R. R. J. Photopolym. Sci. Technol. 1995, 8, 623.
2. (b) Allen R. D.; Wan I. Y.; Wallraff G. M.; DiPietro R. A.; Hofer D. C.; Kunz R. R. in Microelectronics Technology, Polymers for Advanced Imaging and Packaging, Reichmanis E.; Ober C. K.; MacDonald S. A.; Iwayanagi T.; Nishikubo, T., Eds.; ACS Symposium Series 614, American Chemical Society: Washington, DC, 1995; p 255-270.
3. (c) Nakano K.; Maeda K.; Iwasa S.; Ohfuji T.; Hasegawa E. Proc. SPIE 1995, 2438, 433-440.
4. (d) Nozaki N.; Kaimoto Y.; Takahashi M.; Takeshi S.; Abe N. Chem. Mater. 1994, 6, 1492-1498
5. (e) Kunz R.R.; Palmateer S.C.; Forte A.R.; Allen R.D.; Wallraff G.M.; DiPietro R.A.; Hofer D.C. Proc SPIE 1996, 2724, 365.
6. (a) Wallow T. I.; Houlihan F.M.; Nalamasu O.; Chandross E.A.; Neenan T.X.; Reichmanis E Proc SPIE 1996, 2724, 355
7. (b) Houlihan F.M.; Wallow T.I.; Timko A.; Neria E.; Hutton R.; Cirelli R.; Nalamasu O.; Reichmanis E. Proc SPIE 1997, 3049, 84
8. (c) Houlihan F.M.; Wallow T.I.; Timko A.; Neria E.; Hutton R.; Cirelli R.; Nalamasu O.; Reichmanis E. J. Photopolym. Sci. Technol., 1997, 10, 511
9. (d) Houlihan F.M.; Wallow T.I.; Nalamasu O.; Reichmansis E. Macromolecules, 1997, 30, 6517.
10. Takechi S.; Kaimoto Y.; Nozaki K.; Abe N. J. Photopolym. Sci. Technol. 1992, Vol 5, No 3, 439.
11. Crivello J.C.; Shim S.Y., Chem Mater 1996, 8, 376.
12. (a) Allen, R.D.; Sooriyakumaran R.; Opitz J.; Wallraff G. M.; DiPietro R. A.; Breyta G.; Hofer D.; Kunz R.; Jayaraman S.; Shick R.; Goodall B.; Okoroanyanyu U.; Willson C.G. Proc SPIE, 1996, 2724, 341
13. (b) Niu Q. J.; Meagley R.P.; Frechet J.M.J.; Okoroanyanwu U.; Willson C.G. Proc SPIE 1997, 3049, 113
14. (c) Okoroanyanwu U.; Shumikawa T.; Medeiros D. Willson C.G.; Niu J. Q.; Frechet J.M.J.; Byers J.; Allen R. Proc SPIE, 1997, 3049, 92.
15. See Cowie, J. M. G. in Comprehensive Polymer Science; Allen, G.; Bevington, J. C.; Eastmond, G. C.; Ledwith, A.; Russo, S.; Sigwalt, P. Eds; Pergamon: Oxford, 1989; Vol. 4, Chapter 22, and references therein.
16. Potter, G. H.; Zutty, N. L. U.S. Patent 3 280 080, 1966.
17. The P(NB/MA/AAXX) nomenclature refers to feed ratio rather than experimentally determined composition as outlined in the experimental section of reference 2d.
18. Volksen, W.; Pascal, T.; Labadie J. W.; Sanchez M. I. in Polymers for Microelectronics; Thompson L. F.; Willson C. G.; Tagawa S. Eds; ACS Symposium Series 537; American Chemical Society: Washington DC, 1994; p. 403.
19. Reichmanis E.; Wilkins Jr C.W.; Chandross A.E.; J. Vac Sci Technol, 1981, 19(4) 1338.
20. Wilkins Jr C.W.; Reichmanis E.; Chandross A.E.; J. Electrochemical Soc., 1982, 129, No11, 2552.
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22. Crivello JV Chem Mater Sci, 1994, 6 2167.
23. Aoai T.; Yamanaka T; Kokubo T. SPIE Proc., 1994, 2195, 111
24. Reiser A. In PhotoReactive Polymers The Science and Technology of Resists; Wiley Interscience New York, New York 1989, 1
25. a) Dammel R. In Diazonapthoquinone-based Resist; D. Shea Ed.; SPIE Optical Engineering Press, Bellingham Washington, 1993, p 1.
26. b) ibid p 86.
27. c) ibid p 70
28. Crivello, J.V; Shim, S-Y.; Smith B.W.; Chem Mater, 1994, 6, 2167.
29. Allen, R.D.; Opitz J.; Larson C.E.; DiPietro R. A.; Breyta G.; Hofer D. Proc SPIE, 1997, 3049, 44