Lithographic materials technologies: 193 nm imaging and beyond

Materials Research Society Symposium - Proceedings

Volumn 584, Issue , 2000, Pages 23-32

  Reichmanis, Elsa ^a   Nalamasu, Omkaram ^a   Houlihan, Francis M ^a   Gabor, Allen H ^a   Neisser, Mark O ^a   Bowden, Murrae J ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MASKS; MICROELECTRONICS; ORGANIC POLYMERS; PHOTOLITHOGRAPHY; PRODUCT DESIGN; PRODUCTIVITY;

ALIPHATIC POLYMERS; CHEMICALLY AMPLIFIED RESIST TECHNOLOGIES; DISSOLUTION INHIBITORS; ELECTRONIC INDUSTRY; MICROLITHOGRAPHIC;

PHOTORESISTS;

EID: 0033708915     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (14)