메뉴 건너뛰기




Volumn 30, Issue 21, 1997, Pages 6517-6524

Synthesis of cycloolefin-maleic anhydride alternating copolymers for 193 nm imaging

Author keywords

[No Author keywords available]

Indexed keywords

COPOLYMERIZATION; FREE RADICAL POLYMERIZATION; IMAGING TECHNIQUES; MONOMERS; POLYOLEFINS; SOLUBILITY; SYNTHESIS (CHEMICAL); TERPOLYMERS; THERMODYNAMIC STABILITY;

EID: 0031248699     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma970771w     Document Type: Article
Times cited : (86)

References (32)
  • 1
    • 0022493649 scopus 로고
    • For some leading references on 248 nm chemically amplified resists, see: (a) Willson, C. G.; Frechet, J. M. J.; Tessier, T.; Houlihan, F. M. J. Electrochem. Soc. 1986, 133, 181. Reichmanis, E.; Houlihan, F. M.; Nalamasu, O.; Neenan, T. X. Chem. Mater. 1991, 3, 397.
    • (1986) J. Electrochem. Soc. , vol.133 , pp. 181
    • Willson, C.G.1    Frechet, J.M.J.2    Tessier, T.3    Houlihan, F.M.4
  • 2
    • 0022493649 scopus 로고
    • For some leading references on 248 nm chemically amplified resists, see: (a) Willson, C. G.; Frechet, J. M. J.; Tessier, T.; Houlihan, F. M. J. Electrochem. Soc. 1986, 133, 181. Reichmanis, E.; Houlihan, F. M.; Nalamasu, O.; Neenan, T. X. Chem. Mater. 1991, 3, 397.
    • (1991) Chem. Mater. , vol.3 , pp. 397
    • Reichmanis, E.1    Houlihan, F.M.2    Nalamasu, O.3    Neenan, T.X.4
  • 3
    • 84994439515 scopus 로고
    • For some leading references on 193 nm resists, see: (a) Allen, R. D.; Wan, I. Y.; Wallraff, G. M.; DiPietro, R. A.; Hofer, D. C.; Kunz, R. R. J. Photopolym. Sci. Technol. 1995, 8, 623. (b) Allen, R. D.; Wan, I. Y.; Wallraff, G. M.; DiPietro, R. A.; Hofer, D. C.; Kunz, R. R In Microelectronics Technology, Polymers for Advanced Imaging and Packaging; ACS Symposium Series 614, Reichmanis, E., Ober, C. K., MacDonald, S. A., Iwayanagi, T., Nishikubo, T., Eds.; ACS Symposium Series 614; American Chemical Society: Washington, DC, 1995; pp 255-270. (c) Nakano, K.; Maeda, K.; Iwasa, S.; Ohfuji, T.; Hasegawa, E. Proc. SPIE 1995, 2438, 433-440. (d) Nozaki, N.; Kaimoto, Y.; Takahashi, M. Takeshi, S.; Abe, N. Chem. Mater. 1994, 6, 1492-1498.
    • (1995) J. Photopolym. Sci. Technol. , vol.8 , pp. 623
    • Allen, R.D.1    Wan, I.Y.2    Wallraff, G.M.3    Dipietro, R.A.4    Hofer, D.C.5    Kunz, R.R.6
  • 4
    • 0002838502 scopus 로고
    • Reichmanis, E., Ober, C. K., MacDonald, S. A., Iwayanagi, T., Nishikubo, T., Eds.; ACS Symposium Series 614; American Chemical Society: Washington, DC
    • For some leading references on 193 nm resists, see: (a) Allen, R. D.; Wan, I. Y.; Wallraff, G. M.; DiPietro, R. A.; Hofer, D. C.; Kunz, R. R. J. Photopolym. Sci. Technol. 1995, 8, 623. (b) Allen, R. D.; Wan, I. Y.; Wallraff, G. M.; DiPietro, R. A.; Hofer, D. C.; Kunz, R. R In Microelectronics Technology, Polymers for Advanced Imaging and Packaging; ACS Symposium Series 614, Reichmanis, E., Ober, C. K., MacDonald, S. A., Iwayanagi, T., Nishikubo, T., Eds.; ACS Symposium Series 614; American Chemical Society: Washington, DC, 1995; pp 255-270. (c) Nakano, K.; Maeda, K.; Iwasa, S.; Ohfuji, T.; Hasegawa, E. Proc. SPIE 1995, 2438, 433-440. (d) Nozaki, N.; Kaimoto, Y.; Takahashi, M. Takeshi, S.; Abe, N. Chem. Mater. 1994, 6, 1492-1498.
    • (1995) Microelectronics Technology, Polymers for Advanced Imaging and Packaging; ACS Symposium Series 614 , pp. 255-270
    • Allen, R.D.1    Wan, I.Y.2    Wallraff, G.M.3    DiPietro, R.A.4    Hofer, D.C.5    Kunz, R.R.6
  • 5
    • 0029235844 scopus 로고
    • For some leading references on 193 nm resists, see: (a) Allen, R. D.; Wan, I. Y.; Wallraff, G. M.; DiPietro, R. A.; Hofer, D. C.; Kunz, R. R. J. Photopolym. Sci. Technol. 1995, 8, 623. (b) Allen, R. D.; Wan, I. Y.; Wallraff, G. M.; DiPietro, R. A.; Hofer, D. C.; Kunz, R. R In Microelectronics Technology, Polymers for Advanced Imaging and Packaging; ACS Symposium Series 614, Reichmanis, E., Ober, C. K., MacDonald, S. A., Iwayanagi, T., Nishikubo, T., Eds.; ACS Symposium Series 614; American Chemical Society: Washington, DC, 1995; pp 255-270. (c) Nakano, K.; Maeda, K.; Iwasa, S.; Ohfuji, T.; Hasegawa, E. Proc. SPIE 1995, 2438, 433-440. (d) Nozaki, N.; Kaimoto, Y.; Takahashi, M. Takeshi, S.; Abe, N. Chem. Mater. 1994, 6, 1492-1498.
    • (1995) Proc. SPIE , vol.2438 , pp. 433-440
    • Nakano, K.1    Maeda, K.2    Iwasa, S.3    Ohfuji, T.4    Hasegawa, E.5
  • 6
    • 0001406675 scopus 로고
    • For some leading references on 193 nm resists, see: (a) Allen, R. D.; Wan, I. Y.; Wallraff, G. M.; DiPietro, R. A.; Hofer, D. C.; Kunz, R. R. J. Photopolym. Sci. Technol. 1995, 8, 623. (b) Allen, R. D.; Wan, I. Y.; Wallraff, G. M.; DiPietro, R. A.; Hofer, D. C.; Kunz, R. R In Microelectronics Technology, Polymers for Advanced Imaging and Packaging; ACS Symposium Series 614, Reichmanis, E., Ober, C. K., MacDonald, S. A., Iwayanagi, T., Nishikubo, T., Eds.; ACS Symposium Series 614; American Chemical Society: Washington, DC, 1995; pp 255-270. (c) Nakano, K.; Maeda, K.; Iwasa, S.; Ohfuji, T.; Hasegawa, E. Proc. SPIE 1995, 2438, 433-440. (d) Nozaki, N.; Kaimoto, Y.; Takahashi, M. Takeshi, S.; Abe, N. Chem. Mater. 1994, 6, 1492-1498.
    • (1994) Chem. Mater. , vol.6 , pp. 1492-1498
    • Nozaki, N.1    Kaimoto, Y.2    Takahashi, M.3    Takeshi, S.4    Abe, N.5
  • 19
    • 85033177109 scopus 로고
    • Allen, G., Bevington, J. C., Eastmond, G. C., Ledwith, A., Russo, S., Sigwalt, P., Eds.; Pergamon: Oxford, England, Chapter 22, and references therein
    • See: Cowie, J. M. G. In Comprehensive Polymer Science; Allen, G., Bevington, J. C., Eastmond, G. C., Ledwith, A., Russo, S., Sigwalt, P., Eds.; Pergamon: Oxford, England, 1989; Vol. 4, Chapter 22, and references therein.
    • (1989) Comprehensive Polymer Science , vol.4
    • Cowie, J.M.G.1
  • 20
    • 85033167779 scopus 로고    scopus 로고
    • U. S. Patent 3 280 080, 1966
    • Potter, G. H.; Zutty, N. L. U. S. Patent 3 280 080, 1966.
    • Potter, G.H.1    Zutty, N.L.2
  • 22
    • 85033176056 scopus 로고
    • Ito, T.; Otsu, T.; Imoto, M. Mem. Fac. Eng., Osaka City Univ. 1965, 7, 87; Chem. Abstr. 1967, 66, 76325t.
    • (1967) Chem. Abstr. , vol.66
  • 23
    • 85033163273 scopus 로고    scopus 로고
    • note
    • The P(NB/MA/AAXX) nomenclature refers to the feed ratio rather than the experimentally determined composition as outlined in the Experimental Section.
  • 27
    • 0348192435 scopus 로고
    • Thompson, L. F., Willson, C. G., Tagawa, S., Eds; ACS Symposium Series 537; American Chemical Society: Washington, DC
    • Volksen, W.; Pascal, T.; Labadie, J. W.; Sanchez, M. I. In Polymers for Microelectronics; Thompson, L. F., Willson, C. G., Tagawa, S., Eds; ACS Symposium Series 537; American Chemical Society: Washington, DC, 1994; p 403.
    • (1994) Polymers for Microelectronics , pp. 403
    • Volksen, W.1    Pascal, T.2    Labadie, J.W.3    Sanchez, M.I.4
  • 28
    • 3743127918 scopus 로고
    • Chapman and Hall: New York
    • a = 10.3. See: Polya, J. B. In Comprehensive Heterocyclic Chemistry; Katritzky, A. R.; Rees, C. W.; Potts, K. T. Eds.; Pergamon: Oxford, England, 1984; Vol. 5, Chapter 4.12.
    • (1982) Dictionary of Organic Compounds, 5th Ed. , vol.3 , pp. 2957
  • 29
    • 84990131664 scopus 로고
    • Katritzky, A. R.; Rees, C. W.; Potts, K. T., Eds.; Pergamon: Oxford, England, Chapter 4.06
    • a = 10.3. See: Polya, J. B. In Comprehensive Heterocyclic Chemistry; Katritzky, A. R.; Rees, C. W.; Potts, K. T. Eds.; Pergamon: Oxford, England, 1984; Vol. 5, Chapter 4.12.
    • (1984) Comprehensive Heterocyclic Chemistry , vol.5
    • Grimmett, M.R.1
  • 30
    • 85033163092 scopus 로고
    • Katritzky, A. R.; Rees, C. W.; Potts, K. T. Eds.; Pergamon: Oxford, England, Chapter 4.12
    • a = 10.3. See: Polya, J. B. In Comprehensive Heterocyclic Chemistry; Katritzky, A. R.; Rees, C. W.; Potts, K. T. Eds.; Pergamon: Oxford, England, 1984; Vol. 5, Chapter 4.12.
    • (1984) Comprehensive Heterocyclic Chemistry , vol.5
    • Polya, J.B.1
  • 32
    • 85033189254 scopus 로고
    • Thompson, L. F.; Willson, C. G., Bowden, M. J., Eds.; ACS Symposium Series 215; American Chemical Society: Washington, DC
    • Thompson, L. F.; Bowden, M. J. In Introduction to Microlithography; Thompson, L. F.; Willson, C. G., Bowden, M. J., Eds.; ACS Symposium Series 215; American Chemical Society: Washington, DC, 1983; p 170.
    • (1983) Introduction to Microlithography , pp. 170
    • Thompson, L.F.1    Bowden, M.J.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.