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1
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0022493649
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For some leading references on 248 nm chemically amplified resists, see: (a) Willson, C. G.; Frechet, J. M. J.; Tessier, T.; Houlihan, F. M. J. Electrochem. Soc. 1986, 133, 181. Reichmanis, E.; Houlihan, F. M.; Nalamasu, O.; Neenan, T. X. Chem. Mater. 1991, 3, 397.
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For some leading references on 248 nm chemically amplified resists, see: (a) Willson, C. G.; Frechet, J. M. J.; Tessier, T.; Houlihan, F. M. J. Electrochem. Soc. 1986, 133, 181. Reichmanis, E.; Houlihan, F. M.; Nalamasu, O.; Neenan, T. X. Chem. Mater. 1991, 3, 397.
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84994439515
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For some leading references on 193 nm resists, see: (a) Allen, R. D.; Wan, I. Y.; Wallraff, G. M.; DiPietro, R. A.; Hofer, D. C.; Kunz, R. R. J. Photopolym. Sci. Technol. 1995, 8, 623. (b) Allen, R. D.; Wan, I. Y.; Wallraff, G. M.; DiPietro, R. A.; Hofer, D. C.; Kunz, R. R In Microelectronics Technology, Polymers for Advanced Imaging and Packaging; ACS Symposium Series 614, Reichmanis, E., Ober, C. K., MacDonald, S. A., Iwayanagi, T., Nishikubo, T., Eds.; ACS Symposium Series 614; American Chemical Society: Washington, DC, 1995; pp 255-270. (c) Nakano, K.; Maeda, K.; Iwasa, S.; Ohfuji, T.; Hasegawa, E. Proc. SPIE 1995, 2438, 433-440. (d) Nozaki, N.; Kaimoto, Y.; Takahashi, M. Takeshi, S.; Abe, N. Chem. Mater. 1994, 6, 1492-1498.
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Reichmanis, E., Ober, C. K., MacDonald, S. A., Iwayanagi, T., Nishikubo, T., Eds.; ACS Symposium Series 614; American Chemical Society: Washington, DC
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For some leading references on 193 nm resists, see: (a) Allen, R. D.; Wan, I. Y.; Wallraff, G. M.; DiPietro, R. A.; Hofer, D. C.; Kunz, R. R. J. Photopolym. Sci. Technol. 1995, 8, 623. (b) Allen, R. D.; Wan, I. Y.; Wallraff, G. M.; DiPietro, R. A.; Hofer, D. C.; Kunz, R. R In Microelectronics Technology, Polymers for Advanced Imaging and Packaging; ACS Symposium Series 614, Reichmanis, E., Ober, C. K., MacDonald, S. A., Iwayanagi, T., Nishikubo, T., Eds.; ACS Symposium Series 614; American Chemical Society: Washington, DC, 1995; pp 255-270. (c) Nakano, K.; Maeda, K.; Iwasa, S.; Ohfuji, T.; Hasegawa, E. Proc. SPIE 1995, 2438, 433-440. (d) Nozaki, N.; Kaimoto, Y.; Takahashi, M. Takeshi, S.; Abe, N. Chem. Mater. 1994, 6, 1492-1498.
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5
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0029235844
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For some leading references on 193 nm resists, see: (a) Allen, R. D.; Wan, I. Y.; Wallraff, G. M.; DiPietro, R. A.; Hofer, D. C.; Kunz, R. R. J. Photopolym. Sci. Technol. 1995, 8, 623. (b) Allen, R. D.; Wan, I. Y.; Wallraff, G. M.; DiPietro, R. A.; Hofer, D. C.; Kunz, R. R In Microelectronics Technology, Polymers for Advanced Imaging and Packaging; ACS Symposium Series 614, Reichmanis, E., Ober, C. K., MacDonald, S. A., Iwayanagi, T., Nishikubo, T., Eds.; ACS Symposium Series 614; American Chemical Society: Washington, DC, 1995; pp 255-270. (c) Nakano, K.; Maeda, K.; Iwasa, S.; Ohfuji, T.; Hasegawa, E. Proc. SPIE 1995, 2438, 433-440. (d) Nozaki, N.; Kaimoto, Y.; Takahashi, M. Takeshi, S.; Abe, N. Chem. Mater. 1994, 6, 1492-1498.
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Nakano, K.1
Maeda, K.2
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Ohfuji, T.4
Hasegawa, E.5
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6
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0001406675
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For some leading references on 193 nm resists, see: (a) Allen, R. D.; Wan, I. Y.; Wallraff, G. M.; DiPietro, R. A.; Hofer, D. C.; Kunz, R. R. J. Photopolym. Sci. Technol. 1995, 8, 623. (b) Allen, R. D.; Wan, I. Y.; Wallraff, G. M.; DiPietro, R. A.; Hofer, D. C.; Kunz, R. R In Microelectronics Technology, Polymers for Advanced Imaging and Packaging; ACS Symposium Series 614, Reichmanis, E., Ober, C. K., MacDonald, S. A., Iwayanagi, T., Nishikubo, T., Eds.; ACS Symposium Series 614; American Chemical Society: Washington, DC, 1995; pp 255-270. (c) Nakano, K.; Maeda, K.; Iwasa, S.; Ohfuji, T.; Hasegawa, E. Proc. SPIE 1995, 2438, 433-440. (d) Nozaki, N.; Kaimoto, Y.; Takahashi, M. Takeshi, S.; Abe, N. Chem. Mater. 1994, 6, 1492-1498.
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85033163273
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The P(NB/MA/AAXX) nomenclature refers to the feed ratio rather than the experimentally determined composition as outlined in the Experimental Section.
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