Fullerene-incorporated nanocomposite resist system for nanolithography

Materials Research Society Symposium - Proceedings

Volumn 584, Issue , 2000, Pages 103-114

  Ishii, T ^a   Nozawa, H ^a   Kuramochi, E ^a   Tamamura, T ^a  

^a NTT Basic Research Laboratories   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DISSOLUTION; ETCHING; FULLERENES; HEAT RESISTANCE; HIGH ELECTRON MOBILITY TRANSISTORS; NANOSTRUCTURED MATERIALS; SOLUBILITY; STRENGTH OF MATERIALS;

ELECTRON BEAM RESIST; ETCHING RESISTANCE; X RAY MASKS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0033709354     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (25)