Negative chemically amplified resist characterization for direct write and SCALPEL nanolithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 3705-3708

  Ocola, L E ^a   Biddick, C J ^a   Tennant, D M ^a   Waskiewicz, W K ^a   Novembre, A E ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001253526     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590394     Document Type: Article

References (8)

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8. K. Nakajima et al., Jpn. J. Appl. Phys., Part 1 36, 7535 (1997).