New high performance CA resist for e-beam lithography

Materials Research Society Symposium - Proceedings

Volumn 584, Issue , 2000, Pages 147-153

  Kwong, Ranee ^a   Huang, Wu Song ^a   Moreau, Wayne ^a   Lang, Robert ^a   Robinson, Christopher ^a   Medeiros, David R ^a   Aviram, Ari ^a   Guarnieri, Richard C ^a   Angelopoulos, Marie ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING; MASKS; ORGANIC SOLVENTS; POLYMETHYL METHACRYLATES; POLYSTYRENES; REACTIVE ION ETCHING; SEMICONDUCTING SILICON;

CHEMICALLY AMPLIFIED RESIST; CHROME MASKS; POLYMETHYL CHLOROACRYLATE; POLYMETHYL STYRENE; WET ETCH PROCESS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0033693912     PISSN: 02729172     EISSN: None     Source Type: Journal    
DOI: 10.1557/PROC-584-147     Document Type: Article

References (0)