Control of plasma properties in capacitively coupled oxygen discharges via the electrical asymmetry effect

Journal of Physics D: Applied Physics

Volumn 44, Issue 28, 2011, Pages

  Schungel E ^a   Zhang, Q Z ^b   Iwashita, S ^a   Schulze, J ^a,c   Hou, L J ^d   Wang, Y N ^b   Czarnetzki, U ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

^b DALIAN UNIVERSITY OF TECHNOLOGY   (China)

^c INSTITUTE OF EXPERIMENTAL MEDICINE   (Hungary)

^d MAX PLANCK INSTITUT FÜR EXTRATERRESTRISCHE PHYSIK   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANALYTICAL APPROACH; BOMBARDING ENERGIES; CAPACITIVELY COUPLED; DENSITY PROFILE; DUAL FREQUENCY; ELECTRONEGATIVE DISCHARGE; EXPERIMENTAL INVESTIGATIONS; FLEXIBLE CONTROL; ION ENERGIES; ION FLUXES; LOW PRESSURES; PEAK DENSITY; PHASE ANGLES; PLASMA PROPERTIES; POTENTIAL PROFILES; POWER ABSORPTION; RESONANCE OSCILLATION; SELF-BIAS; TIME-AVERAGED; VOLTAGE SOURCE;

CHEMICAL BONDS; DC POWER TRANSMISSION; ELECTRIC PROPERTIES; ELECTRONEGATIVITY; ION BOMBARDMENT; IONS; LASER CHEMISTRY; OXYGEN; PLASMA DEVICES;

ELECTRIC DISCHARGES;

EID: 79960242296     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/44/28/285205     Document Type: Article

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