Numerical simulations of electrical asymmetry effect on electronegative plasmas in capacitively coupled rf discharge

Journal of Applied Physics

Volumn 109, Issue 1, 2011, Pages

  Zhang, Quan Zhi ^a   Jiang, Wei ^a   Hou, Lu Jing ^b   Wang, You Nian ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

^b MAX PLANCK INSTITUT FÜR EXTRATERRESTRISCHE PHYSIK   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON DISCHARGES; CAPACITIVELY COUPLED; CAPACITIVELY COUPLED RF DISCHARGE; DRIVING VOLTAGES; DUAL FREQUENCY; ELECTRONEGATIVE PLASMAS; ION ENERGIES; ION FLUXES; LOW PRESSURES; NUMERICAL SIMULATION; OXYGEN PLASMAS; PHASE ANGLES; PLASMA SERIES RESONANCE; POWER ABSORPTION; RADIO FREQUENCIES; SELF BIAS VOLTAGE;

ARGON; CHEMICAL BONDS; ELECTRONEGATIVITY; IONS; OXYGEN; PLASMA DENSITY; PLASMAS;

ELECTRIC DISCHARGES;

EID: 78751549648     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3530626     Document Type: Article

References (39)

1. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing, 2nd ed. (Wiley, New York, 2005).
2. T. Makabe and Z. L. Petrovic, Plasma Electronics: Applications in Microelectronic Device Fabrication (Taylor and Francis, New York, 2006).
3. H. H. Goto, H. D. Lowe, and T. Ohmi, J. Vac. Sci. Technol. A 10, 3048 (1992).
4. T. Kitajima, Y. Takeo, Z. L. Petrovic, and T. Makabe, Appl. Phys. Lett. 77, 489 (2000).
5. G. Wakayama and K. Nanbu, IEEE Trans. Plasma Sci. 31, 638 (2003).
6. P. C. Boyle, A. R. Ellingboe, and M. M. Turner, Plasma Sources Sci. Technol. 13, 493 (2004).
7. M. M. Turner and P. Chabert, Phys. Rev. Lett. 96, 205001 (2006).
8. Z. Donkó and Z. Lj. Petrovic, J. Phys.: Conf. Ser. 86, 012011 (2007).
9. J. K. Lee, O. V. Manuilenko, N. Y. Babaeva, H. C. Kim, and J. W. Shon, Plasma Sources Sci. Technol. 14, 89 (2005).
10. E. Kawamura, M. A. Lieberman, and A. J. Lichtenberg, Phys. Plasmas 13, 053506 (2006).
11. B. G. Heil, U. Czarnetzki, R. P. Brinkmann, and T. Mussenbrock, J. Phys. D: Appl. Phys. 41, 165202 (2008).
12. Z. Donkó, J. Schulze, B. G. Heil, and U. Czarnetzki, J. Phys. D: Appl. Phys. 42, 025205 (2009).
13. J. Schulze, E. Schungel, and U. Czarnetzki, J. Phys. D: Appl. Phys. 42, 092005 (2009).
14. J. Schulze, E. Schungel, U. Czarnetzki, and Z. Donkó, J. Appl. Phys. 106, 063307 (2009).
15. Z. Donkó, J. Schulze, U. Czarnetzki, and D. Luggenholscher, Appl. Phys. Lett. 94, 131501 (2009).
16. J. Schulze, Z. Donkó, D. Luggenholscher, and U. Czarnetzki, Plasma Sources Sci. Technol. 18, 034011 (2009).
17. J. Schulze, E. Schungel, Z. Donkó, and U. Czarnetzki, Plasma Sources Sci. Technol. 19, 045028 (2010).
18. A. J. Lichtenberg, V. Vahedi, and M. A. Lieberman, J. Appl. Phys. 75, 2339 (1994).
19. T. H. Chung, J. Korean Phys. Soc. 34, 24 (1999).
20. D. L. Tolliver, VLSI Electronics: Microstructure Science, edited by N. G. Einspruch and D. M. Brown (Academic, New York, 1984).
21. J. Siejka and J. Perriere, Thin Solid Films 14, 81 (1989).
22. D. A. Carl, D. W. Hess, M. A. Lieberman, and R. Gronsky, J. Appl. Phys. 70, 3301 (1991).
23. M. Kitajima, H. Kuroki, H. Shinno, and K. G. Nakamura, Solid State Commun. 83, 385 (1992).
24. M. B. Kizling and S. G. Järås, Appl. Catal., A 147, 1 (1996).
25. F. Nicolazo, A. Goullet, A. Granier, C. Vallee, G. Tubran, and B. Grolleau, Surf. Coat. Technol. 98, 1578 (1998).
26. J. Meichsner, M. Zeuner, B. Krames, M. Nitschke, R. Rochodzki, and K. Barucki, Surf. Coat. Technol. 98, 1565 (1998).
27. C. K. Birdsall and A. B. Langdon, Plasma Physics via Computer Simulation (McGraw-Hill, New York, 1985).
28. V. Vahedi and M. Surendra, Comput. Phys. Commun. 87, 179 (1995).
29. J. T. Gudmundsson, I. G. Kouznetsov, K. K. Patel, and M. A. Lieberman, J. Phys. D: Appl. Phys. 34, 1100 (2001).
30. E. Bultinck and A. Bogaerts, New J. Phys. 11, 103010 (2009).
31. F. X. Bronold, K. Matyash, D. Tskhakaya, R. Schneider, and H. Fehske, J. Phys. D: Appl. Phys. 40, 6583 (2007).
32. K. Denpoh and K. Nanbu, J. Vac. Sci. Technol. A 16, 1201 (1998).
33. S. Yonemura and K. Nanbu, IEEE Trans. Plasma Sci. 31, 479 (2003).
34. Q. Z. Zhang, W. Jiang, S. X. Zhao, and Y. N. Wang, J. Vac. Sci. Technol. A 28, 287 (2010).
35. E. Kawamura, Particle-in-cell simulations of bounded plasma discharges applied to low pressure high density sources and positive columns, Ph.D. thesis, University of California, 2003.
36. U. Czarnetzki, T. Mussenbrock, and R. P. Brinkmann, Phys. Plasmas 13, 123503 (2006).
37. M. A. Lieberman, A. J. Lichtenberg, E. Kawamura, T. Mussenbrock, and R. P. Brinkmann, Phys. Plasmas 15, 063505 (2008).
38. T. Mussenbrock, R. P. Brinkmann, M. A. Lieberman, A. J. Lichtenberg, and E. Kawamura, Phys. Rev. Lett. 101, 085004 (2008).
39. V. A. Godyak, Phys. Plasmas 12, 055501 (2005).