Functional separation of biasing and sustaining voltages in two-frequency capacitively coupled plasma

Applied Physics Letters

Volumn 77, Issue 4, 2000, Pages 489-491

  Kitajima, T ^a   Takeo, Y ^a   Petrovic Z Lj ^a   Makabe, T ^a  

^a KEIO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001480674     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.127020     Document Type: Article

References (13)

1. S. Nishikawa, Editorial Digest of Papers International Forum on Semiconductor Technology (ASET, Tokyo, 1998); M. Sasago, ibid. (1999).
2. S. Nishikawa, Editorial Digest of Papers International Forum on Semiconductor Technology (ASET, Tokyo, 1998); M. Sasago, ibid. (1999).
3. T. Tatsumi, H. Hayashi, S. Morishita, S. Noda, M. Okigawa, N. Itabashi, Y. Hikosaka, and M. Inoue, Jpn. J. Appl. Phys., Part 1 37, 2394 (1998).
4. V. Vahedi, C. K. Birdsall, M. A. Lieberman, G. DiPeso, and T. D. Rognlien, Phys. Fluids B 5, 2719 (1993).
5. T. Kitamura, N. Nakano, and T. Makabe, Plasma Sources Sci. Technol. 2. 40 (1993).
6. S. Samukawa, H. Ohtake, and T. Tsukada, J. Vac. Sci. Technol. A 14, 3004 (1996).
7. H. H. Goto, H.-D. Lowe, and T. Ohmi, J. Vac. Sci. Technol. A 10, 3048 (1992).
8. T. Kitajima, Y. Takeo, and T. Makabe, J. Vac. Sci. Technol. A 17, 2510 (1999).
9. A. V. Phelps and Z. Lj. Petrović, Plasma Sources Sci. Technol. 8, R20 (1999).
10. S. Kakuta, T. Makabe, and F. Tochikubo, J. Appl. Phys. 74, 4907 (1993).
11. T. Kitajima, M. Izawa, N. Nakano, and T. Makabe, J. Phys. D 30, 1783 (1997).
12. V. D. Stojanović, B. M. Jelenković, and Z. Lj. Petrović, J. Appl. Phys. 81, 1601 (1997).
13. S. Samukawa, H. Othake, and T. Mieno, J. Vac. Sci. Technol. A 14, 3049 (1996).