Modes of rf capacitive discharge in low-pressure sulfur hexafluoride

Journal of Physics D: Applied Physics

Volumn 40, Issue 22, 2007, Pages 6989-6999

  Lisovskiy, V ^a   Booth, J P ^b   Jolly, J ^b   Martins, S ^c   Landry, K ^c   Douai, D ^d   Cassagne, V ^e   Yegorenkov, V ^a  

^a V N KARAZIN KHARKIV NATIONAL UNIVERSITY   (Ukraine)

^b ECOLE POLYTECHNIQUE   (France)

^c Unaxis Displays Division France SAS   (France)

^d IRFM   (France)

^e Riber   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; ELECTRIC CURRENTS; ELECTRON TEMPERATURE; IONIZATION POTENTIAL; PLASMA DENSITY;

ACTIVE DISCHARGE CURRENTS; DISSOCIATION RATES; ELECTRON IMPACT; THRESHOLD VALUES;

ELECTRIC DISCHARGES;

EID: 36448950898     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/40/22/020     Document Type: Article

References (41)

1. Christophorou L G, Olthoff J K and Van Brunt R J 1997 IEEE Electr. Insulation Mag. 13 20
2. Moreau W M 1988 Semiconductor Lithography: Principles, Practices, and Materials (New York: Plenum)
3. Shul R J and Pearton S J 2000 Handbook of Advanced Plasma Processing Techniques (Berlin: Springer)
4. Nordheden K J, Upadhyaya K, Lee Y-S, Gogineni S P and Kao M-Y 2000 J. Electrochem. Soc. 147 3850
5. Leonard D, Bertrand P, Khairallah-Abdelnour Y, Arefi-Khonsari F and Amouroux J 1995 Surf. Interface Anal. 23 467
6. Riccardi C, Barni R, Fontanesi M, Marcandalli B, Massafra M, Selli E and Mazzone G 2001 Plasma Sources Sci. Technol. 10 92
7. Ullal S J, Singh H, Daugherty J, Vahedi V and Aydil E S 2002 J. Vac. Sci. Technol. A 20 1195
8. Kakuta S, Petrovic Z Lj, Tochikubo F and Makabe T 1993 J. Appl. Phys. 74 4923
9. Nakano N, Petrovic Z Lj and Makabe T 1994 Japan. J. Appl. Phys. 33 2223
10. Okuno Y, Ohtsu Y and Fujita H 1994 Phys. Lett. A 193 94
11. Foest R, Olthoff J K, Van Brunt R J, Benck E C and Roberts J R 1996 Phys. Rev. E 54 1876
12. Koike K, Fukuda T, Fujikawa S and Saeda M 1997 Japan. J. Apl. Phys. 36 5724
13. Levitskii S M 1957 Sov. Phys.-Tech. Phys. 2 887
14. Raizer Y P, Shneider M N and Yatsenko N A 1995 Radio-Frequency Capacitive Discharges (Boca Raton, FL: CRC Press)
15. Yatsenko N A 1981 Sov. Phys.-Tech. Phys. 26 678
16. Lisovskiy V A 1998 Tech. Phys. 43 526
17. Lisovskiy V A and Yegorenkov V D 2004 Vacuum 74 19
18. Godyak V A and Khanneh A S 1986 IEEE Trans. Plasma Sci. PS-14 112
19. Vidaud P, Durrani S M A and Hall D R 1988 J. Phys. D: Appl. Phys. 21 57
20. Belenguer Ph and Boeuf J P 1990 Phys. Rev. A 41 4447
21. Boeuf J P and Belenguer Ph 1990 Fundamental properties of RF glow discharges: an approach based on self-consistent numerical models Nonequilibrium Processes in Partially Ionized Gases ed M Capitelli and J N Bardsley (New York: Plenum) p 155
22. Lisovskiy V, Booth J-P, Landry K, Douai D, Cassagne V and Yegorenkov V 2006 Phys. Plasmas 13 103505
23. Ogle D B and Woolsey G A 1987 J. Phys. D: Appl. Phys. 20 453
24. Lisovskiy V A and Yegorenkov V D 1998 J. Phys. D: Appl. Phys. 31 3349
25. Lisovskiy V, Martins S, Landry K, Douai D, Booth J-P and Cassagne V 2005 J. Phys. D: Appl. Phys. 38 872
26. Lisovskiy V, Martins S, Landry K, Douai D, Booth J-P, Cassagne V and Yegorenkov V 2005 Phys. Plasmas 12 093505
27. Lisovskiy V, Booth J-P, Martins S, Landry K, Douai D and Cassagne V 2005 Europhys. Lett. 71 407
28. Nakano N and Makabe T 1995 J. Phys. D: Appl. Phys. 28 31
29. Shibata M, Nakano N and Makabe T 1995 J. Appl. Phys. 77 6181
30. Makabe T, Tochikubo F and Nishimura M 1990 Phys. Rev. A 42 3674
31. Segawa S, Kurihara M, Nakano N and Makabe T 1999 Japan. J. Appl. Phys. B 38 4416
32. Sommerer T J and Kushner M J 1992 J. Appl. Phys. 71 1654
33. Lymberopoulos D P and Economou D J 1995 J. Phys. D: Appl. Phys. 28 727
34. Pitchford L C, Belenguer Ph and Boeuf J P 1993 Microwave Discharges: Fundamentals and Applications ed C M Ferreira and M Moisan (New York: Plenum)
35. Gottscho R A 1987 Phys. Rev. A 36 2233
36. Lisovskiy V A and Yegorenkov V D 2006 Vacuum 80 458
37. Iio M, Goto M, Toyoda H and Sugai H 1995 Contrib. Plasma Phys. 4-5 405
38. Tarnovsky V, Deutsch H, Martus K E and Becker K 1998 J. Chem. Phys. 109 6596
39. Basner R, Schmidt M, Denisov E, Becker K and Deutsch H 2001 J. Chem. Phys. 114 1170
40. McDaniel E W 1964 Collision Phenomena in Ionized Gases (New York: Wiley)
41. Lisovskiy V, Landry K, Douai D, Booth J-P, Cassagne V and Yegorenkov V 2007 J. Phys. D: Appl. Phys. 40 6631