Self-consistent particle simulation of radio-frequency CF4 discharge with implementation of all ion-neutral reactive collisions

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 3, 1998, Pages 1201-1206

  Denpoh, Kazuki ^a   Nanbu, Kenichi ^b  

^a TOKYO ELECTRON LTD   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002643506     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581259     Document Type: Article

References (23)

1. S. Samukawa, Proceedings of the 3rd International Conference on Reaclive Plasmas and 14th Symposium on Plasma Processing, Nara, 1997, pp. 513-514.
2. Y. Horiike, S. Takayanagi, H. Oshio, T. Ichiki, Y. Sawa, and H. Shindo, Proceedings of the 3rd International Conference on Reactive Plasmas and 14th Symposium on Plasma Processing, Nara, 1997, pp. 515-516.
3. M. J. Kushner, Solid State Technol. 39, 135 (1996).
4. D. Edelson and D. L. Flamm, J. Appl. Phys. 56, 1522 (1984).
5. L. D. B. Kiss and H. H. Sawin, Plasma Chem. Plasma Process. 12, 523 (1992).
6. R. E. P. Harvey, W. N. G. Hitchon, and G. J. Parker, J. Appl. Phys. 75, 1940 (1994).
7. E. Gogolides, M. Stathakopoulos, and A. Boudouvis, J. Phys. D: Appl. Phys. 27, 1978 (1994).
8. N. V. Mantzaris, A. Boudouvis, and E. Gogolides, J. Appl. Phys. 77, 6169 (1995).
9. K. Nanbu and Y. Kitatani, J. Phys. D: Appl. Phys. 28, 324 (1995).
10. J. I. Steinfeld, J. S. Francisco, and W. L. Hase, Chemical Kinetics and Dynamics (Tokyo Kagaku Doujin, Tokyo, 1995), Japanese edition.
11. M. Haverlag, A. Kono, D. Passchier, G. M. W. Kroesen, W. J. Goedheer, and F. J. de Hoog, J. Appl. Phys. 70, 3472 (1991).
12. H. Itoh, Y. Matsumura, K. Satoh, Y. Nakao, and H. Tagashira, Proceedings of the 21st Internal Conference on Phenomena in Ionized Gases, Bochum, 1993, Vol. 1, pp. 385-386.
13. C. K. Birdsall, IEEE Trans. Plasma Sci. 19, 65 (1991).
14. A. A. Radzig and B. M. Smimov, Reference Data on Atoms, Molecules, and Ions (Springer, Berlin, 1985).
15. E. R. Fisher, M. E. Weber, and P. B. Armentrout, J. Chem. Phys. 92, 2296 (1990).
16. I. Iga, M. V. V. S. Rao, S. K. Srivastava, and J. C. Nogueira, Z. Phys. D 24, 111 (1992).
17. K. Nanbu, S. Igarashi, and S. Mitamura, Rep. Inst. Fluid Sci., Tohoku Univ. 3, 35 (1991).
18. K. Nanbu, Jpn. J. Appl. Phys., Part 1 33, 4752 (1994).
19. K. Nanbu and K. Denpoh, J. Phys. Soc. Jpn., 67 (in press).
20. M. Shibata, N. Nakano, and T. Makabe, J. Appl. Phys. 77, 6181 (1995).
21. M. Surendra and D. B. Graves, IEEE Trans. Plasma Sci. 19, 144 (1991).
22. K. Stephan, H. Deutsch, and T. D. Mark, J. Chem. Phys. 83, 5712 (1985).
23. D. L. Flamm, in Plasma Etching, An Introduction, edited by D. M. Manos and D. L. Flamm (Academic, San Diego, CA, 1989), Chap. 2.