Power dynamics in a low pressure capacitively coupled plasma discharge

Plasma Sources Science and Technology

Volumn 19, Issue 1, 2010, Pages

  Rauf, Shahid ^a   Bera, Kallol ^a   Collins, Ken ^a  

^a APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITIVELY COUPLED; CAPACITIVELY COUPLED PLASMAS; COUPLED PARTICLES; ELECTRON DENSITIES; ELECTRON HEATING; ENERGETIC ELECTRON; EXCITATION FREQUENCY; FLUID MODELS; GAS PRESSURES; HIGHER FREQUENCIES; LOW PRESSURES; PLASMA BULK; PLASMA PRODUCTION; POWER DYNAMICS; SECONDARY ELECTRON EMISSIONS; SHEATH EDGE; SHEATH EXPANSION;

CARRIER CONCENTRATION; ELECTRIC DISCHARGES; ELECTRON BEAMS; ELECTRON DENSITY MEASUREMENT; ELECTRON SCATTERING; INDUCTIVELY COUPLED PLASMA; PLASMA HEATING; SECONDARY EMISSION;

ELECTRONS;

EID: 76649121892     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/19/1/015014     Document Type: Article

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