Ion energy distribution control in single and dual frequency capacitive plasma sources

Plasma Sources Science and Technology

Volumn 14, Issue 1, 2005, Pages 89-97

  Lee, J K ^a   Manuilenko, O V ^a   Babaeva, N Yu ^a   Kim, H C ^a   Shon, J W ^b  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b LAM RESEARCH CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; ELECTRIC DISCHARGES; ELECTRIC POTENTIAL; ELECTRODES; MONTE CARLO METHODS; NATURAL FREQUENCIES;

CAPACITIVELY COUPLED PLASMA (CCP); ION ENERGY DISTRIBUTION FUNCTION (IEDF); PLASMA DEPOSITION; PLASMA POTENTIALS;

PLASMA SOURCES;

EID: 14644407418     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/14/1/012     Document Type: Article

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