Plasma characteristics of an Ar/CF4/N2 discharge in an asymmetric dual frequency reactor: Numerical investigation by a PIC/MC model

Plasma Sources Science and Technology

Volumn 15, Issue 3, 2006, Pages 368-377

  Georgieva, V ^a   Bogaerts, A ^a  

^a UNIVERSITY OF ANTWERP   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; ELECTRIC DISCHARGES; GROUNDING ELECTRODES; MONTE CARLO METHODS; PLASMA APPLICATIONS;

BIAS VOLTAGE; DUAL FREQUENCY REACTORS; ELECTRON DENSITY DISTRIBUTION; GROUNDED ELECTRODES;

ELECTRIC REACTORS;

EID: 33745586628     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/15/3/010     Document Type: Article

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