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Journal of Applied Physics

Volumn 108, Issue 11, 2010, Pages

450 mm dual frequency capacitively coupled plasma sources: Conventional, graded, and segmented electrodes

(2) Yang, Yang a Kushner, Mark J b

a Iowa State University (United States)

b UNIVERSITY OF MICHIGAN (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AR PLASMAS; CAPACITIVELY COUPLED PLASMAS; COMPUTATIONAL INVESTIGATION; DESTRUCTIVE INTERFERENCE; DUAL FREQUENCY; ELECTRICAL DISTANCE; ELECTRON DENSITIES; EXCITATION FREQUENCY; FINITE WAVELENGTH; FULL-WAVE SOLUTIONS; HIGH FREQUENCY; MAXWELL'S EQUATIONS; MICROELECTRONICS FABRICATION; PLASMA UNIFORMITY; SEGMENTED ELECTRODES; SHEATH EDGE; TOOL DESIGNS; WAFER DIAMETER; WAVE BEHAVIOR;

ELECTRODES; INDUCTIVELY COUPLED PLASMA; MAXWELL EQUATIONS; MICROELECTRONICS;

WAVE EQUATIONS;

EID: 78751519975 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3517104 Document Type: Article

Times cited : (50)

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