Electrostatic modelling of dual frequency rf plasma discharges

Plasma Sources Science and Technology

Volumn 13, Issue 3, 2004, Pages 493-503

  Boyle, P C ^a   Ellingboe, A R ^a   Turner, M M ^a  

^a DUBLIN CITY UNIVERSITY   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

ION ENERGY; ION FLUX; PLASMA DISCHARGES; POWER SOURCES;

COMPUTER SIMULATION; ELECTRIC POTENTIAL; ELECTRODES; ELECTROSTATICS; IONS; MATHEMATICAL MODELS; PLASMA ETCHING; PRESSURE EFFECTS; SURFACE TREATMENT; THIN FILMS;

PLASMA SOURCES;

EID: 4444337637     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/13/3/016     Document Type: Article

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