Functional separation in two frequency operation of an inductively coupled plasma

Journal of Applied Physics

Volumn 95, Issue 3, 2004, Pages 870-876

  Denda, T ^a   Miyoshi, Y ^a   Komukai, Y ^a   Goto, T ^a   Petrovic Z Lj ^a,b   Makabe, T ^a  

^a KEIO UNIVERSITY   (Japan)

^b UNIVERSITY OF BELGRADE   (Serbia)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ATOMS; CARRIER CONCENTRATION; ELECTRIC POTENTIAL; ELECTRODES; EMISSION SPECTROSCOPY; FLUORINE COMPOUNDS; FREQUENCIES; GROUND STATE; MICROWAVE MEASUREMENT; PRESSURE EFFECTS; SEMICONDUCTOR LASERS;

BIASING VOLTAGE; EXCITED STATES; LASER ABSORPTION SPECTROSCOPY; METASTABLES; OPTICAL EMISSION SPECTROSCOPY; PLASMA KINETICS;

INDUCTIVELY COUPLED PLASMA;

EID: 1142304540     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1636527     Document Type: Article

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