Self-consistent particle-in-cell/Monte Carlo simulation of RF magnetron discharges of oxygen/argon mixture: Effects of partial pressure ratio

IEEE Transactions on Plasma Science

Volumn 31, Issue 4 II, 2003, Pages 479-487

  Yonemura, Shigeru ^a   Nanbu, Kenichi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Magnetron discharge; Oxygen argon mixture; Particle in cell Monte Carlo (PIC MC) simulation; Radio frequency (RF)

Indexed keywords

CARRIER CONCENTRATION; COMPUTER SIMULATION; ELECTRIC FIELD EFFECTS; MAGNETIC FIELD EFFECTS; MAGNETRON SPUTTERING; METALLIC FILMS; MONTE CARLO METHODS; PARTIAL PRESSURE; PLASMA SHEATHS; POISSON EQUATION; POSITIVE IONS; SPUTTER DEPOSITION;

RADIO FREQUENCY;

ELECTRIC DISCHARGES;

EID: 0042428930     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2003.815466     Document Type: Article

References (30)

1. A. E. Wendt, M. A. Lieberman, and H. Meuth, "Radial current distribution at a planar magnetron cathode," J. Vac. Sci. Technol. A, Vac. Surf. Films, vol. 6, pp. 1827-1831, 1988.
2. L. Gu and M. A. Lieberman, "Axial distribution of optical emission in a planar magnetron discharge," J. Vac. Sci. Technol. A, Vac. Surf. Films, vol. 6, pp. 2960-2964, 1988.
3. S. Miyake, N. Shimura, T. Makabe, and A. Itoh, "Diagnostics of direct-current-magnetron discharges by the emission-selected computer-tomography technique," J. Vac. Sci. Technol. A, Vac. Surf. Films, vol. 10, pp. 1135-1139, 1992.
4. 2 etching characteristics in dc and RF magnetron plasmas," Trans. Inst. Elect. Eng. Jpn., vol. 119-A, pp. 490-495, 1999. in Japanese.
5. G. Y. Yeom, J. A. Thornton, and M. J. Kushner, "Cylindrical magnetron discharges. I. Current-voltage characteristics for dc- and RF-driven discharge sources," J. Appl. Phys., vol. 65, pp. 3816-3824, 1989.
6. 2 mixtures," J. Vac. Sci. Technol., vol. 17, pp. 743-751, 1980.
7. J. W. Bradley and G. Lister, "Model of the cathode fall region in magnetron discharges," Plasma Sources Sci. Technol., vol. 6, pp. 524-532, 1997.
8. N. F. Cramer, "Analysis of a one-dimensional, steady-state magnetron discharge," J. Phys. D, Appl. Phys., vol. 30, pp. 2573-2584, 1997.
9. T. E. Sheridan, M. J. Goeckner, and J. Goree, "Model of energetic electron transport in magnetron discharges," J. Vac. Sci. Technol. A, Vac. Surf. Films, vol. 8, pp. 30-37, 1990.
10. S. Ido, M. Kashiwagi, and M. Takahashi, "Computational studies of plasma generation and control in a magnetron sputtering system," Jpn. J. Appl. Phys., vol. 38, pp. 4450-4454, 1999.
11. E. Shidoji, H. Ohtake, N. Nakano, and T. Makabe, "Two-dimensional self-consistent simulation of a dc magnetron discharge," Jpn. J. Appl. Phys., vol. 38, pp. 2131-2136, 1999.
12. K. Nanbu, S. Segawa, and S. Kondo, "Self-consistent particle simulation of three-dimensional dc magnetron discharge," Vacuum, vol. 47, pp. 1013-1016, 1996.
13. K. Nanbu and S. Kondo, "Analysis of three-dimensional dc magnetron discharge by the particle-in-cell/Monte Carlo method," Jpn. J. Appl. Phys., vol. 36, pp. 4808-4814, 1997.
14. T. A. van der Straaten, N. F. Cramer, I. S. Falconer, and B. W. James, "The cylindrical dc magnetron discharge: II. The negative space charge mode," J. Phys. D, Appl. Phys., vol. 31, pp. 191-206, 1998.
15. C. H. Shon, J. S. Park, B. K. Kang, and J. K. Lee, "Kinetic and steady-state properties of magnetron sputter with three-dimensional magnetic field," Jpn. J. Appl. Phys., vol. 38, pp. 4440-4449, 1999.
16. C. K. Birdsall and A. B. Langdon, Plasma Physics via Computer Simulation. New York: McGraw-Hill, 1985.
17. S. Kondo and K. Nanbu, "Axisymmetrical particle-in-cell/Monte Carlo simulation of narrow gap planar magnetron plasmas. I. Direct current-driven discharge," J. Vac. Sci. Technol. A, Vac. Surf. Films, vol. 19, pp. 830-837, 2001.
18. _, "Axisymmetrical particle-in-cell/Monte Carlo simulation of narrow gap planar magnetron plasmas. II. Radio frequency-driven discharge, " J. Vac. Sci. Technol. A, Vac. Surf. Films, vol. 19, pp. 838-847, 2001.
19. 2/Ar mixture," J. Phys. D, Appl. Phys., vol. 33, pp. 2274-2283, 2000.
20. S. Yonemura and K. Nanbu, "Numerical analysis of RF magnetron discharges of oxygen/argon mixture," in Proc. 23rd Int. Symp. Rarefied Gas Dynamics, 2003, pp. 865-872.
21. M. Surendra, D. B. Graves, and G. M. Jellum, "Self-consistent model of a direct-current glow discharge: Treatment of fast electrons," Phys. Rev. A, vol. 41, pp. 1112-1125, 1990.
22. K. Kosaki and M. Hayashi, "Electron-argon atom collision cross sections," Preprint Nat. Mtg. Inst. Elect. Eng., pp. 2-9, 1992. in Japanese.
23. Y. Itikawa, A. Ichimura, K. Onda, K. Sakamoto, K. Takayanagi, Y. Hatano, M. Hayashi, H. Nishimura, and S. Tsurubuchi, "Cross sections for collisions of electrons and photons with oxygen molecules," J. Phys. Chem. Ref. Data, vol. 18, pp. 23-42, 1989.
24. K. Nanbu, "Simple method to determine collisional event in Monte Carlo simulation of electron-molecule collision," Jpn. J. Appl. Phys., vol. 33, pp. 4752-4753, 1994.
25. _, "Probability theory of electron-molecule, ion-molecule, molecule-molecule, and Coulomb collisions for particle modeling of materials processing plasmas and gases," IEEE Trans. Plasma Sci., vol. 28, pp. 971-990, June 2000.
26. K. Nanbu and Y. Kitatani, "An ion-neutral species collision model for particle simulation of glow discharge," J. Phys. D, Appl. Phys., vol. 28, pp. 324-330, 1995.
27. H. W. Ellis, R. Y. Pai, E. W. McDaniel, E. A. Mason, and L. A. Viehland, "Transport properties of gaseous ions over a wide energy range," At. Data Nucl. Data Tables, vol. 17, pp. 177-210, 1976.
28. H. W. Ellis, M. G. Thackston, E. W. McDaniel, and E. A. Mason, "Transport properties of gaseous ions over a wide energy range. Part III," At. Data Nucl. Data Tables, vol. 31, pp. 113-151, 1984.
29. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing. New York: Wiley, 1994, ch. 8.
30. B. N. Chapman, Glow Discharge Processes: Sputtering and Plasma Etching. New York: Wiley, 1980, pp. 84-92.