Temporal structure of electron heating in asymmetric single-frequency and dual-frequency capacitive discharges

Physics of Plasmas

Volumn 16, Issue 2, 2009, Pages

  Ziegler, D ^a   Mussenbrock, T ^a   Brinkmann, R P ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; ELECTRIC POWER UTILIZATION; ENERGY DISSIPATION; HEATING; PLASMA OSCILLATIONS; RESONANCE;

CAPACITIVE DISCHARGES; CAPACITIVELY COUPLED; DUAL FREQUENCIES; ELECTRON HEATING; GLOBAL MODELS; HEATING PROCESS; HIGH-FREQUENCY POWER; LOW FREQUENCIES; LOW-PRESSURE PLASMAS; NON-RESONANT; OHMIC HEATING; PLASMA BOUNDARIES; POWER DISSIPATIONS; SELF EXCITATIONS; SINGLE FREQUENCIES; STOCHASTIC HEATING; TEMPORAL STRUCTURES; WORK STUDIES;

ELECTRIC DISCHARGES;

EID: 61449095596     PISSN: 1070664X     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3076206     Document Type: Article

References (36)

1. V. A. Godyak, Sov. Phys. Tech. Phys. 16, 1073 (1972).
2. M. A. Lieberman, IEEE Trans. Plasma Sci. 0093-3813 10.1109/27.16552 16, 638 (1988).
3. M. M. Turner, Phys. Rev. Lett. 0031-9007 10.1103/PhysRevLett.75.1312 75, 1312 (1995).
4. M. A. Lieberman and V. A. Godyak, IEEE Trans. Plasma Sci. 0093-3813 10.1109/27.700878 26, 955 (1998).
5. G. Gozadinos, M. M. Turner, and D. Vender, Phys. Rev. Lett. 0031-9007 10.1103/PhysRevLett.87.135004 87, 135004 (2001).
6. I. D. Kaganovich, Phys. Rev. Lett. 0031-9007 10.1103/PhysRevLett.89. 265006 89, 265006 (2002).
7. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing, 2nd ed. (Wiley, New York, 2005).
8. E. Kawamura, M. A. Lieberman, and A. J. Lichtenberg, Phys. Plasmas 1070-664X 10.1063/1.2203949 13, 053506 (2006).
9. M. M. Turner and P. Chabert, Phys. Rev. Lett. 0031-9007 10.1103/PhysRevLett.96.205001 96, 205001 (2006).
10. M. M. Turner and P. Chabert, Plasma Sources Sci. Technol. 0963-0252 10.1088/0963-0252/16/2/020 16, 364 (2007).
11. B. P. Wood, M. A. Lieberman, and A. J. Lichtenberg, IEEE Trans. Plasma Sci. 0093-3813 10.1109/27.90327 19, 619 (1991).
12. B. M. Annaratone, V. P. T. Ku, and J. E. Allen, J. Appl. Phys. 0021-8979 10.1063/1.359242 77, 5455 (1995).
13. V. P. T. Ku, B. M. Annaratone, and J. E. Allen, J. Appl. Phys. 0021-8979 10.1063/1.369025 84, 6536 (1998).
14. V. P. T. Ku, B. M. Annaratone, and J. E. Allen, J. Appl. Phys. 0021-8979 10.1063/1.369026 84, 6546 (1998).
15. N. Tanizuka and J. E. Allen, J. Plasma Phys. 0022-3778 10.1017/S0022377899007576 61, 469 (1999).
16. T. Mussenbrock and R. P. Brinkmann, Appl. Phys. Lett. 0003-6951 10.1063/1.2194824 88, 151503 (2006).
17. G. Franz and M. Klick, J. Vac. Sci. Technol. A 0734-2101 10.1116/1.1947201 23, 917 (2005).
18. E. Semmler, A. von Keudell, and P. Awakowicz, Plasma Sources Sci. Technol. 0963-0252 10.1088/0963-0252/16/4/020 16, 839 (2007).
19. Q. H. Yuan, Y. Xin, G. Q. Yin, X. J. Huang, K. Sun, and Z. Y. Ning, J. Phys. D: Appl. Phys. 41, 205209 (2008).
20. D. Ziegler, T. Mussenbrock, and R. P. Brinkmann, Plasma Sources Sci. Technol. 17, 045011 (2008).
21. U. Czarnetzki, T. Mussenbrock, and R. P. Brinkmann, Phys. Plasmas 1070-664X 10.1063/1.2397043 13, 123503 (2006).
22. B. G. Heil, R. P. Brinkmann, and U. Czarnetzki, J. Phys. D: Appl. Phys. 41, 225208 (2008).
23. M. A. Lieberman, A. J. Lichtenberg, E. Kawamura, T. Mussenbrock, and R. P. Brinkmann, Phys. Plasmas 1070-664X 10.1063/1.2928847 15, 063505 (2008).
24. T. Mussenbrock, R. P. Brinkmann, M. A. Lieberman, A. J. Lichtenberg, and E. Kawamura, Phys. Rev. Lett. 0031-9007 10.1103/PhysRevLett.101.085004 101, 085004 (2008).
25. M. A. Lieberman, J. -P. Booth, P. Chabert, J. -M. Rax, and M. M. Turner, Plasma Sources Sci. Technol. 0963-0252 10.1088/0963-0252/11/3/310 11, 283 (2002).
26. P. Chabert, J. Phys. D: Appl. Phys. 40, R63 (2007).
27. I. Lee, D. B. Graves, and M. Lieberman, Plasma Sources Sci. Technol. 0963-0252 10.1088/0963-0252/17/1/015018 17, 015018 (2008).
28. T. Mussenbrock, T. Hemke, D. Ziegler, R. P. Brinkmann, and M. Klick, Plasma Sources Sci. Technol. 0963-0252 10.1088/0963-0252/17/2/025018 17, 025018 (2008).
29. P. J. Hargis, Jr., K. E. Greenberg, P. A. Miller, J. B. Gerardo, J. R. Torczymski, M. E. Roley, G. A. Hebner, J. R. Roberts, J. K. Olthoff, J. R. Whetstone, R. J. Van Brunt, M. M. Sobolewski, H. M. Anderson, M. P. Splichal, J. L. Mock, P. Bletzinger, A. Garscadden, R. A. Gottscho, G. Selwyn, M. Dalvie, J. E. Heidenreich, J. W. Bitterbaugh, M. L. Brake, M. L. Passov, J. Pender, A. Lujan, M. E. Elta, D. B. Graves, H. H. Sawin, M. J. Kushner, T. Verdeyen, R. Honvath, and T. R. Turner, Rev. Sci. Instrum. 0034-6748 10.1063/1.1144770 65, 140 (1994).
30. A. Metze, D. W. Ernie, and H. J. Oskam, J. Appl. Phys. 0021-8979 10.1063/1.337764 60, 3081 (1986).
31. T. Gans, J. Schulze, D. O'Connell, U. Czarnetzki, R. Faulkner, A. R. Ellingboe, and M. M. Turner, Appl. Phys. Lett. 0003-6951 10.1063/1.2425044 89, 261502 (2006).
32. D. O'Connell, T. Gans, E. Semmler, and P. Awakowicz, Appl. Phys. Lett. 0003-6951 10.1063/1.2972117 93, 081502 (2008).
33. D. Vender and R. W. Boswell, J. Vac. Sci. Technol. A 10, 4 (1991).
34. D. O'Connell, T. Gans, D. Vender, U. Czarnetzki, and R. Boswell, Phys. Plasmas 1070-664X 10.1063/1.2717889 14, 034505 (2007).
35. J. Schulze, B. G. Heil, D. Luggenhoelscher, T. Mussenbrock, R. P. Brinkmann, and U. Czarnetzki, J. Phys. D: Appl. Phys. 41, 042003 (2008).
36. J. Schulze, B. G. Heil, D. Luggenhoelscher, R. P. Brinkmann, and U. Czarnetzki, J. Phys. D: Appl. Phys. 41, 195212 (2008).