SCOPUS 정보 검색 플랫폼

Nanoscale

Volumn 3, Issue 7, 2011, Pages 2679-2688

Lithography, metrology and nanomanufacturing

(2) Liddle, J Alexander a Gallatin, Gregg M a

a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMER SELF-ASSEMBLY; BOTTOM-UP NANOFABRICATION; COLLOIDAL SELF-ASSEMBLY; COST EFFECTIVE; LITHOGRAPHY TOOLS; MANUFACTURING COST; MEMORY CHIPS; NANO-IMPRINT; NANO-MANUFACTURING; NANO-MANUFACTURING TECHNOLOGY; NANOFABRICATION TECHNIQUES; NANOMETRES; PRODUCTION STREAMS; REAL TIME; SELF ASSEMBLY PROCESS; SEMICONDUCTOR CHIP MANUFACTURING; STABILITY AND CONTROL; TOPDOWN;

BLOCK COPOLYMERS; LITHOGRAPHY; MANUFACTURE; NANOTECHNOLOGY; PROCESS CONTROL; SELF ASSEMBLY; UNITS OF MEASUREMENT;

MEASUREMENTS;

METAL; NANOMATERIAL; POLYMER;

ARTICLE; CHEMISTRY; NANOTECHNOLOGY; SEMICONDUCTOR;

METALS; NANOSTRUCTURES; NANOTECHNOLOGY; POLYMERS; SEMICONDUCTORS;

EID: 79960200196 PISSN: 20403364 EISSN: 20403372 Source Type: Journal
DOI: 10.1039/c1nr10046g Document Type: Review

Times cited : (87)

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