PREVAIL - IBM's e-beam technology for next generation lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 206-213

  Pfeiffer, Hans C ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; ELECTRON OPTICS; OPTICAL INSTRUMENT LENSES;

COULOMB INTERACTION ABERRATIONS; ELECTRON-BEAM PROJECTION OPTICS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0033713119     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (21)