E-beam direct write (EBDW) as complementary lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7823, Issue PART 1, 2010, Pages

  Lam, David ^a   Liu, Dave ^a   Prescop, Ted ^a  

^a Multibeam Corporation   (United States)

Author keywords

1 D design layout; 193nm resolution; Complementary lithography; E beam lithography; EBDW; Maskless lithography; ML2; NGL

Indexed keywords

193NM RESOLUTION; COMPLEMENTARY LITHOGRAPHY; DESIGN LAYOUT; E-BEAM LITHOGRAPHY; EBDW; MASK-LESS LITHOGRAPHY; ML2; NGL;

LOGIC DESIGN; MANUFACTURE; PHOTOMASKS; POSITION CONTROL;

ELECTRON BEAM LITHOGRAPHY;

EID: 78649807964     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.868485     Document Type: Conference Paper

References (11)

1. Liebmann, L., Elakkumanan, P., & Abercrombie, D., "Restrictive Design Rules and Their Impact on 22 nm Design and Physical Verification," Electronic Design Process Symposium (April 2009).
2. "TSMC New Standard Cell Slim Library Reduces Logic Area 15%," TSMC press release (June 15, 2010).
3. "45nm Design for Manufacturing," Intel Technology Journal, Volume 12, Issue 2 (2008).
4. "Nikon Fellow Discusses Means to Extend Immersion to 10 nm Half Pitch," The Nikon eReview (Spring 2010).
5. Lin, B., "Marching of the microlithography horses: electron, ion, and photon: past, present, and future," SPIE Advanced Lithography (Feb. 27, 2007).
6. Lin, B., "Lithography For 22nm Node High-Volume Manufacturing," Semicon West (July 25, 2008).
7. MacWilliams, K., "SPIE panel: DP is only litho solution for 22nm volume production," Solid State Technology (2009).
8. Lammers, D., "TSMC's Burn Lin Touts E-Beam, Slams EUV," Semiconductor International (Dec. 22, 2009).
9. Lin, B., "Multiple E-beam Decisions for 22nm and Sub-22nm Lithography," Synopsys Tech Forum (2010).
10. "Intel Sr. Fellow Recommends Complementary Solutions for ArF Extension," The Nikon eReview (Spring 2010).
11. Borodovsky, Y., "MPProcessing for PProcessors," SEMATECH Maskless Lithography and Multibeam Mask Writer Workshop (May 2010).