A paradigm shift in scatterometry-based metrology solution addressing the most stringent needs of today as well as future lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7638, Issue , 2010, Pages

  Ke, C M ^a   Shih, Victor ^a   Huang, Jacky ^a   Chen, L J ^a   Wang, Willie ^a   Huang, G T ^a   Yang, W T ^a   Wang, Sophia ^a   Liang, C R ^a   Liu, H H ^a   Lee, H J ^a   Terng, L G ^a   Gau, T S ^a   Lin, John ^a   Bhattacharyya, Kaustuve ^b   Van Der Schaar, Maurits ^b   Wright, Noelle ^b   Noot, Marc ^b   Shahrjerdy, Mir ^b   Wang, Vivien ^b   Lin, Spencer ^b   Wu, Jon ^b   Peng, Sophie ^b   Liu, Gavin ^b   Tzeng, Wei Shun ^b   Chen, Jim ^b   Fuchs, Andreas ^b   Adam, Omer ^b   Wang, Cathy ^b   more..

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

^b ASML   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ADVANCED LITHOGRAPHY; HOT PLATES; INTEGRATED METROLOGY; MONITOR WAFERS; PARADIGM SHIFTS; TWO SECTION;

LITHOGRAPHY; MEASUREMENTS; ROBUST CONTROL; TECHNICAL PRESENTATIONS; THREE DIMENSIONAL; UNITS OF MEASUREMENT;

PROCESS CONTROL;

EID: 79551625581     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.853318     Document Type: Conference Paper

References (6)

1. Jimmy Hu, C. M. Ke, K. Bhattacharyya et al.: "A comprehensive look at a new metrology technique to support the needs of lithography performance in near future", SPIE Asia (2008)
2. K. Bhattacharyya, C.M. Ke at al.: "Evaluation of a new metrology technique to support the needs of accuracy, precision, speed and sophistication in near-future lithography", SPIE (2009)
3. C.M. Ke, N. Wright, K. Bhattacharyya et al.: "A scatterometry-based CD metrology solution for advanced nodes; including capability of handling bi-refringent layers with uniaxial anisotropy", SPIE (2009)
4. Victor Shih, C.M. Ke, K. Bhattacharyya et al: "A sophisticated metrology solution for advanced lithography, addressing the most stringent needs of today as well as future lithography", SPIE Asia (2009)
5. Martin A. van den Brink, "Holistic Lithography Optimization: Wafer Lithography, Computational Lithography and Layout ", plenary presentation, SPIE (2008)
6. C. M. Ke, "Overlay Similarity: A New Overlay Index for Metrology Tool and Scanner Overlay Fingerprint Methodology", SPIE (2009)