Taming pattern and focus variation in VLSI design

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5379, Issue , 2004, Pages 139-148

  Heng, Fook Luen ^a   Gupta, Puneet ^b   Lai, Kafai ^c   Gordon, Ron ^c   Lee, Jin Fuw ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c IBM MICROELECTRONICS   (United States)

Author keywords

ACLV; Systematic Variation; Through focus variation; Through pitch variation

Indexed keywords

APPLICATION SPECIFIC INTEGRATED CIRCUITS; CMOS INTEGRATED CIRCUITS; COMPUTER SIMULATION; ETCHING; INTEGRATED CIRCUIT LAYOUT; LITHOGRAPHY; MASKS; MATHEMATICAL MODELS; MICROPROCESSOR CHIPS; PATTERN RECOGNITION;

ACROSS CHIP LINEWIDTH VARIATIONS (ACLV); SYSTEMATIC VARIATIONS; THROUGGH-PITCH VARIATIONS; THROUGH-FOCUS VARIATIONS;

VLSI CIRCUITS;

EID: 2942655177     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.538271     Document Type: Conference Paper

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