Advanced self-aligned double patterning development for sub-30-nm DRAM manufacturing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7274, Issue , 2009, Pages

  Shiu, Weicheng ^a   Liu, Hung Jen ^a   Wu, Jan Shiun ^a   Tseng, Tsu Li ^a   Liao, Chun Te ^a   Liao, Chien Mao ^a   Liu, Jerry ^a   Wang, Troy ^a  

^a NANYA TECHNOLOGY CORPORATION   (Taiwan)

Author keywords

193nm dry scanner; Alignment; Double patterning technique (DPT); Extreme UV (EUV); Immersion scanner; Overlay; Scanners with high index fluids; Self aligned double pattern (SADP); Sub 40 nm

Indexed keywords

193NM DRY SCANNER; DOUBLE PATTERNING TECHNIQUE (DPT); EXTREME UV (EUV); IMMERSION SCANNER; OVERLAY; SCANNERS WITH HIGH INDEX FLUIDS; SELF-ALIGNED DOUBLE PATTERN (SADP); SUB-40 NM;

ALIGNMENT; FLUIDS; LAWS AND LEGISLATION; NANOLITHOGRAPHY; PHOTORESISTS; PRINTING; ROUGHNESS MEASUREMENT; TITRATION; ULTRAVIOLET DEVICES;

SCANNING;

EID: 65849148606     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.813986     Document Type: Conference Paper

References (13)

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