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Volumn 7637, Issue , 2010, Pages

Advances in roll-to-roll imprint lithography for display applications

Author keywords

imprint lithography; R2R; roll to roll; SAIL; self aligned imprint lithography

Indexed keywords

3-DIMENSIONAL; ACTIVE MATRIXES; BACKPLANES; BLANKET MATERIALS; DISPLAY APPLICATION; FLEXIBLE SUBSTRATE; IMPRINT LITHOGRAPHY; LAYER ALIGNMENT; MULTI-LEVEL; ROLL TO ROLL; SELF-ALIGNED; TRANSISTOR ARRAYS; UNDERLYING LAYERS;

EID: 77953309419     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.852268     Document Type: Conference Paper
Times cited : (34)

References (4)
  • 3
    • 77953310602 scopus 로고    scopus 로고
    • Method of replicating a high resolution three-dimensional pattern on a compliant media of arbitrary size
    • U. S. Patent No. 6808646(B1)
    • Jeans, A., "Method of replicating a high resolution three-dimensional pattern on a compliant media of arbitrary size," U. S. Patent No. 6808646(B1) (2004).
    • (2004)
    • Jeans, A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.