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Volumn 7637, Issue , 2010, Pages
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Advances in roll-to-roll imprint lithography for display applications
a b a a b a a a b b a a a a a a c c c c more.. |
Author keywords
imprint lithography; R2R; roll to roll; SAIL; self aligned imprint lithography
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Indexed keywords
3-DIMENSIONAL;
ACTIVE MATRIXES;
BACKPLANES;
BLANKET MATERIALS;
DISPLAY APPLICATION;
FLEXIBLE SUBSTRATE;
IMPRINT LITHOGRAPHY;
LAYER ALIGNMENT;
MULTI-LEVEL;
ROLL TO ROLL;
SELF-ALIGNED;
TRANSISTOR ARRAYS;
UNDERLYING LAYERS;
POLYIMIDES;
TRANSISTORS;
NANOIMPRINT LITHOGRAPHY;
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EID: 77953309419
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.852268 Document Type: Conference Paper |
Times cited : (34)
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References (4)
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