Extendibility of chemically amplified amplified resists: Another brick wall?

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5039 I, Issue , 2003, Pages 1-14

  Hinsberg, William ^a   Houle, Frances ^a   Sanchez, Martha ^a   Hoffnagle, John ^a   Wallraff, Gregory ^a   Medeiros, David ^b   Gallatin, Gregg ^b   Cobb, Jonathan ^c  

^a IBM ALMADEN RESEARCH CENTER   (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

^c MOTOROLA INC   (United States)

Author keywords

Chemically amplified resists; Diffusion; Dissolution; Resolution; Roughness; Shot noise

Indexed keywords

IMAGING TECHNIQUES; INTEGRATED CIRCUIT MANUFACTURE; MICROELECTRONICS; NANOTECHNOLOGY;

CHEMICALLY AMPLIFIED RESIST; HIGH ASPECT RATIO IMAGING; IMAGE BLUR; LINE-EDGE ROUGHNESS; SEMICONDUCTOR INDUSTRY;

PHOTORESISTS;

EID: 0141500074     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.487739     Document Type: Conference Paper

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