SEMATECH's Nanoimprint Program: A Key Enabler for Nanoimprint Introduction

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7271, Issue , 2009, Pages

  Litt, Lloyd C ^a,b   Malloy, Matt ^a  

^a SEMATECH   (United States)

^b ADVANCED MICRO DEVICES   (United States)

Author keywords

Lithography; Nanoimprint,

Indexed keywords

AUTOMATED TOOLS; CLEANING CYCLES; CRITICAL DIMENSION; DEFECTIVITY; DEVELOPMENT PROGRAMS; IMAGING EXPERIMENTS; IMMERSION LITHOGRAPHY; LINEWIDTH ROUGHNESS; MANUFACTURING APPLICATIONS; MASK CLEANING; MOLECULAR IMPRINT; NANOIMPRINT PROCESS; NANOIMPRINT TECHNOLOGY; NANOIMPRINT,; SEMATECH;

STRATEGIC PLANNING; TECHNOLOGY;

NANOIMPRINT LITHOGRAPHY;

EID: 67149144864     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814370     Document Type: Conference Paper

References (1)

1. Willson, SPIE Newsroom 10.1117/2.1200607.0313, 2006 SPIE - The International Society for Optical Engineering,