Flying plasmonic lens in the near field for high-speed nanolithography

Nature Nanotechnology

Volumn 3, Issue 12, 2008, Pages 733-737

  Srituravanich, Werayut ^a   Pan, Liang ^a   Wang, Yuan ^a   Sun, Cheng ^a   Bogy, David B ^a   Zhang, Xiang ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BEARINGS (MACHINE PARTS); COSTS; NANOLITHOGRAPHY; PLASMONICS; SURFACE PLASMONS;

DESIGN CHANGE; HIGH THROUGHPUT; HIGH-THROUGHPUT APPROACHES; NANOSCALE DEVICE; ORDERS OF MAGNITUDE; PLASMONIC LENS; SCANNING PROBE LITHOGRAPHY; SHORT WAVELENGTHS;

THROUGHPUT;

ARTICLE; DEVICE; HIGH THROUGHPUT SCREENING; METHODOLOGY; NANOFABRICATION; NANOLITHOGRAPHY; NANOTECHNOLOGY; PLASMONIC LENS; PRIORITY JOURNAL; SPECTRAL SENSITIVITY; SURFACE PLASMON RESONANCE;

EID: 57449108697     PISSN: 17483387     EISSN: 17483395     Source Type: Journal    
DOI: 10.1038/nnano.2008.303     Document Type: Article

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