Atomic-scale templates patterned by ultrahigh vacuum scanning tunneling microscopy on silicon

Annual Review of Physical Chemistry

Volumn 60, Issue , 2009, Pages 193-216

  Walsh, Michael A ^a   Hersam, Mark C ^a,b  

^a Northwestern University   (United States)

^b NORTHWESTERN UNIVERSITY   (United States)

Author keywords

Feedback controlled lithography; Nanoelectronics; Nanolithography; Surface chemistry

Indexed keywords

ATOMS; DANGLING BONDS; ELECTRONIC PROPERTIES; HYBRID MATERIALS; HYDROGEN BONDS; NANOSTRUCTURES; PASSIVATION; SCANNING TUNNELING MICROSCOPY; SILICON; SUBSTRATES; SURFACE CHEMISTRY;

ATOMIC PRECISION; ATOMIC SCALE; FEEDBACK-CONTROLED LITHOGRAPHY; HIGH RESOLUTION; HYDROGEN ATOMS; NANOPATTERNING; PHYSICAL ELECTRONICS; SCANNING TUNNELLING MICROSCOPES; ULTRAHIGH-VACUUM SCANNING TUNNELING MICROSCOPES; ULTRAHIGH-VACUUM SCANNING TUNNELING MICROSCOPY;

FEEDBACK;

EID: 67651061886     PISSN: 0066426X     EISSN: None     Source Type: Book Series    
DOI: 10.1146/annurev.physchem.040808.090314     Document Type: Review

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