The coming of age of tilt CD-SEM

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6518, Issue PART 2, 2007, Pages

  Bunday, B ^a   Allgair, J ^a   Solecky, E ^b   Archie, C ^b   Orji, N G ^c   Beach, J ^a   Adan, O ^d   Peltinov, R ^d   Bar zvi, M ^d   Swyers, J ^e  

^a SEMATECH   (United States)

^b IBM MICROELECTRONICS   (United States)

^c NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^d Applied Materials Inc Israel   (Israel)

^e APPLIED MATERIALS INC   (United States)

Author keywords

CD AFM; CD SEM; FinFET; Profile measurement; SEM based metrology; SWA; Tilt beam

Indexed keywords

ATOMIC FORCE MICROSCOPY; ETCHING; MEASUREMENT THEORY; PHOTORESISTS; PROCESS CONTROL; SCANNING ELECTRON MICROSCOPY;

FINFET STRUCTURES; PROFILE MEASUREMENT; SEM BASED METROLOGY; SIDEWALL ANGLE (SWA);

LITHOGRAPHY;

EID: 35148819669     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.714214     Document Type: Conference Paper

References (15)

1. International Technology Roadmap for Semiconductors, 2006 Edition, http://member.itrs.net.
2. Bunday, B., Azordegan, A., Vladar, A., Singh, B., Banke, B., Hartig, C., Archie, C., Joy, D., Solecky, E., Cao, G., Villarrubia, J., and Postek, M. "Unified Advanced Critical Dimension Scanning Electron Microscope (CD-SEM) Specification for sub-90 nm Technology (2006 Version)." ISMI Tech Transfer document ID# 04114595C-ENG, Dec 2006. Non-confidential, available on SEMATECH website, http://www.sematecb.org.
3. M. Sendelbach and C. Archie, "Scatterometry Measurement Precision and Accuracy Below 70 nm," SPIE: Metrology, Inspection, and Process Controlfor Microlithography XVII (2003), v5035, pp 224-238, 2003.
4. M. Sendelbach, C. Archie, and B. Banke, "Correlating Scatterometry to CD-SEM and Electrical Gate Measurements at the 90 nm Node Using TMU Analysis," SPIE: Metrology, Inspection, and Process Control for Microlithography XVIII (2004), v5375, pp 550-563, 2004.
5. Bunday, B., Sorkhabi, O., Wen, Y., Paranjpe, A., Terbeek, P., Allgair, J., and Peterson, A. "Improvement in Total Measurement Uncertainty for Gate CD Control." Procedings of SPIE 2005, v5878, pp 0M-1 to OM-12.
6. Guide to the Expression of Uncertainty in Measurement, International Organization for Standardization, Geneva (1995).
7. Bunday, B., Bishop, M., Bennett, M., Swyers, J., Haberman-Golan, Z. "Quantitative Profile Shape Measurement Study on a CD-SEM with Application to Etch-Bias Control." SPIE Microlithography Conference 2002, Proc. SPIE v4689, p. 138 2002.
8. Bunday, B., Bishop, M., Swyers, J., Lensing, K.. "Quantitative Profile-Shape Measurement Study on a CD-SEM with Application to Etch-Bias Control and Several Different CMOS Features." SPIE Microlithography Conference 2003, Proc. SPIE v5038, p. 383-395.
9. Bunday, B., Michelson, D., Allgair, J., Tam, A., Chase-Colin, D., Dajczman, A., Adan, O., and Har-Zvi, M. "CD-SEM Metrology Macro CD Technology-Beyond the Average." Proceedings of SPIE 2005, v5752, pp 111-126.
10. N.G. Orji, R. G. Dixson, A. Martinez, B.D. Bunday, J.A Allgair, T. V. Vorburger "Progress on Implementation of a CD-AFM-Based Reference Measurement System" accepted for publication Journal of Micro/Nanolithography, MEMS and MOEMS
11. W. T. Estler, "Calibration and use of a straightedge in the metrology of precision machines" Optical Engineering, 23 (3), 372 (1985)
12. R. G. Dixson, N.T. Sullivan, J. Schneir, T. H. McWaid, V. W. Tsai, J. Prochazka, M. Young, "Measurement of a CD and sidewall angle artifact with two-dimensional CD AFM metrology'' Proc. SPIE Vol. 2725, p. 572-588 (1996)
13. C. P. Ausschnitt and S. Y. Cheng, "Modeling for profile-based process-window metrology," Proceedings of the SPIE: Metrology, Inspection, and Process Control for Microlithography 2004, 5378
14. T. A. Brunner and C. P. Ausschnitt, "Process monitor gratings," Proceedings of the SPIE: Metrology, Inspection, and Process Control for Microlithography 2007, 6518-02, this conference.
15. J. S. Villarrubia, A. E. Vladar, B. D. Bunday, and M. Bishop "Dimensional metrology of resist lines using a SEM model-based library approach" Proc. SPIE 5375, 199 (2004)