Resolution limitations in chemically amplified photoresist systems

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5376, Issue PART 1, 2004, Pages 333-342

  Schmid, Gerard M ^a   Stewart, Michael D ^a   Wang, Chia Ying ^b   Vogt, Bryan D ^b   Prabhu, Vivek M ^b   Lin, Eric K ^b   Willson, C Grant ^a  

^a The University of Texas at Austin   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Chemically amplified photoresist; Photolithography; Resolution limit

Indexed keywords

CHEMICAL AMPLIFICATION; PHOTOACID GENERATORS (PAG);

AMPLIFICATION; CATALYSIS; CATALYSTS; DIFFUSION; LITHOGRAPHY; SEMICONDUCTING FILMS; TRANSMISSION ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION;

PHOTORESISTS;

EID: 3843090432     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.536656     Document Type: Conference Paper

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