Full-field exposure performance of electron projection lithography tool

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 6, 2004, Pages 2885-2890

  Suzuki, Kazuaki ^a   Hirayanagi, Noriyuki ^a   Fujiwara, Tomoharu ^a   Yamada, Atsushi ^a   Ikeda, Junji ^a   Yahiro, Takehisa ^a   Kojima, Shinichi ^a   Udagawa, Jin ^a   Yamamoto, Hajime ^a   Katakura, Norihiro ^a   Suzuki, Motoko ^a   Aoyama, Takashi ^a   Takekoshi, Hidekazu ^a   Umemoto, Takaaki ^a   Shimizu, Hiroyasu ^a   Fukui, Saori ^a   Suzuki, Shohei ^a   Okino, Teruaki ^a   Ohkubo, Yukiharu ^a   Shimoda, Toshimasa ^a   Tanida, Toru ^a   Watanabe, Yoichi ^a   Kohama, Yoshiaki ^a   Ohmori, Kaoru ^a   Mori, Futoshi ^a   Takemoto, Shigeru ^a   Yoshioka, Takeshi ^a   Hirose, Hiroshi ^a   Morita, Kenji ^a   Hada, Kazunari ^a   Kawata, Shintaro ^a   Kakizaki, Yukio ^a   Miura, Takaharu ^a   more..

^a NIKON CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACCELERATION; COMPUTER SIMULATION; ELECTRIC CURRENTS; ELECTRON BEAMS; PHOTOLITHOGRAPHY; PROJECTION SYSTEMS; VELOCITY MEASUREMENT;

ACCELERATION VOLTAGE; AERIAL IMAGES; COULOMB BLUR; ELECTRON OPTICAL SYSTEMS;

ELECTRON BEAM LITHOGRAPHY;

EID: 19944431429     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1808715     Document Type: Conference Paper

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