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Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6923, Issue , 2008, Pages

Sub-40nm half-pitch double patterning with resist freezing process

(11) Hori, Masafumi a Nagai, Tomoki a Nakamura, Atsushi a Abe, Takayoshi a Wakamatsu, Gouji a Kakizawa, Tomohiro a Anno, Yuusuke a Sugiura, Makoto a Kusumoto, Shiro a Yamaguchi, Yoshikazu a Shimokawa, Tsutomu a

a JSR CORPORATION (Japan)

Author keywords

Double patterning; Freezing; Lithography; Sub 40nm half pitch

Indexed keywords

LITHOGRAPHY; TECHNOLOGY;

ARF LITHOGRAPHIES; DOUBLE PATTERNING; ETCH PROCESSES; FREEZING PROCESSES; HIGH THROUGHPUTS; LINE PROCESSES; LITHOGRAPHIC PROCESSES; NEW TECHNOLOGIES; PATTERNING PROCESSES; RESEARCH GROUPS; SUB-40NM HALF-PITCH;

FREEZING;

EID: 51549115631 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.772403 Document Type: Conference Paper

Times cited : (84)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.