Trajectory displacement effect in particle projection lithography systems: Modifications to the extended two-particle theory and Monte Carlo simulation technique

Journal of Applied Physics

Volumn 84, Issue 8, 1998, Pages 4549-4567

  Jansen, G H ^a,b  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b Telfort   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ION BEAM LITHOGRAPHY; MATHEMATICAL MODELS; MONTE CARLO METHODS; NUMERICAL METHODS;

SPACE CHARGE MAGNIFICATION EFFECTS; STATISTICAL COULOMB EFFECT; TRAJECTORY DISPLACEMENT EFFECT; TWO PARTICLE THEORY;

ELECTRON BEAM LITHOGRAPHY;

EID: 0032531579     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.368681     Document Type: Article

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