Ion beam lithography and nanofabrication: A review

International Journal of Nanoscience

Volumn 4, Issue 3, 2005, Pages 269-286

  Watt, F ^a   Bettiol, A A ^a   Van Kan, J A ^a   Teo, E J ^a   Breese, M B H ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

Focused ion beam; Ion beam lithography; Ion projection lithography; Nanofabrication; Proton beam writing

Indexed keywords

FOCUSED ION BEAM; ION PROJECTION LITHOGRAPHY; NANOIMPRINTING; PROTON BEAM WRITING;

ASPECT RATIO; ELECTROMAGNETIC WAVE DIFFRACTION; ION BEAMS; MASKS; NANOTECHNOLOGY; PROTONS; SEMICONDUCTOR DEVICE MANUFACTURE; TECHNOLOGY TRANSFER;

ION BEAM LITHOGRAPHY;

EID: 22944492135     PISSN: 0219581X     EISSN: None     Source Type: Journal    
DOI: 10.1142/S0219581X05003139     Document Type: Review

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