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Volumn 22, Issue 2, 2011, Pages

Nanometrology using a through-focus scanning optical microscopy method

Author keywords

Critical dimension; Defect analysis; Dimensional analysis; MEMS; Nanomanufacturing; Nanometrology; Nanoparticles; NEMS; Optical microscope; Overlay metrology; Process control; Through focus; TSOM

Indexed keywords

DEFECTS; GEOMETRICAL OPTICS; MEMS; MICROSCOPES; NANOPARTICLES; NEMS; OPTICAL DATA STORAGE; OPTICAL MICROSCOPY; UNITS OF MEASUREMENT;

EID: 79251514647     PISSN: 09570233     EISSN: 13616501     Source Type: Journal    
DOI: 10.1088/0957-0233/22/2/024002     Document Type: Article
Times cited : (43)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.