High throughput electron lithography with the multiple aperture pixel by pixel enhancement of resolution concept

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 3177-3180

  Kruit, P ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002067268     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590346     Document Type: Article

References (9)

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