Extension of optical lithography by mask-litho integration with computational lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7748, Issue , 2010, Pages

  Takigawa, T ^a   Gronlund, K ^b   Wiley, J ^b  

^a Brion Technologies KK   (Japan)

^b Brion Technologies Inc   (United States)

Author keywords

CD uniformity; Complex mask; Freeform source; Mask process correction (MPC); Optical lithography; Printability check; Source mask optimization (SMO)

Indexed keywords

CD UNIFORMITY; FREEFORMS; MASK OPTIMIZATION; MASK PROCESS; OPTICAL LITHOGRAPHY;

DATA STORAGE EQUIPMENT; INSPECTION; INSPECTION EQUIPMENT; MODEL PREDICTIVE CONTROL; OPTIMIZATION; PHOTOLITHOGRAPHY; PREDICTIVE CONTROL SYSTEMS; SCANNING;

MASKS;

EID: 77954405783     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.866840     Document Type: Conference Paper

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