Projection charged particle nanolithography and nanopatterning

Japanese Journal of Applied Physics

Volumn 49, Issue 6 PART 2, 2010, Pages

  Loeschner, Hans ^a   Klein, Christof ^a   Platzgummer, Elmar ^a  

^a IMS NANOFABRICATION AG   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

APERTURE PLATE; APPLICATION FIELDS; BEAMLETS; BROAD BEAMS; COMPLEMENTARY METAL OXIDE SEMICONDUCTORS; COMPLEX PATTERN; CROSS-OVER; EXPOSURE TOOL; MULTI BEAM TECHNIQUES; MULTI-BEAM; MULTIBEAMS; NANOFABRICATION; NANOPATTERNING; PROGRAMMABLE APERTURE PLATES; PROJECTION MASK-LESS LITHOGRAPHIES; PROOF-OF-CONCEPT TESTS; TEST-SYSTEM;

CHARGED PARTICLES; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; PUNCHING;

PLATE METAL;

EID: 77955319379     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.49.06GE01     Document Type: Article

References (5)

1. E. Platzgummer, C. Klein, P. Joechl, H. Loeschner, M. Witt, W. Pilz, J. Butschke, M. Jurisch, F. Letzkus, H. Sailer, and M. Irmscher: Proc. SPIE 7488 (2009) 74881D.
2. C. Klein, J. Klikovits, L. Szikszai, E. Platzgummer, and H. Loeschner: Microelectron. Eng. 87 (2010) 1154.
3. F. van Delft: private communications.
4. G. Stengl, H. Loeschner, and E. Platzgummer: U.S. Patent 7,214,951 (2007).
5. H. C. Pfeiffer: plenary talk at MNE 2009 [www.mne09.org].