Distortion and overlay performance of UV step and repeat imprint lithography

Microelectronic Engineering

Volumn 78-79, Issue 1-4, 2005, Pages 633-640

  Choi, Jin ^a   Nordquist, Kevin ^b   Cherala, Ashuman ^a   Casoose, Lester ^c   Gehoski, Kathy ^b   Dauksher, William J ^b   Sreenivasan, S V ^a   Resnick, Douglas J ^b  

^a MOLECULAR IMPRINTS INC   (United States)

^b MOTOROLA INC   (United States)

^c FREESCALE SEMICONDUCTOR INC   (United States)

Author keywords

Imprint Lithography; Overlay; S FIL; Template distortion

Indexed keywords

CHROMIUM; DATA REDUCTION; ELECTRIC DISTORTION; ELECTRON BEAMS; FABRICATION; GLASS TRANSITION; HIGH PRESSURE EFFECTS; IMAGE ANALYSIS; MONOMERS; NANOTECHNOLOGY; SILICON WAFERS; THERMAL EFFECTS; ULTRAVIOLET RADIATION;

IMPRINT LITHOGRAPHY; NANO IMPRINT LITHOGRAPHY; OVERLAYS; STEP AND FLASH™ IMPRINT LITHOGRAPHY (S-FIL™); TEMPLATE DISTORTION;

LITHOGRAPHY;

EID: 14944377048     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2004.12.097     Document Type: Conference Paper

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