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Journal of Applied Physics

Volumn 83, Issue 9, 1998, Pages 4690-4694

Influence of interfacial hydrogen on Al thin film nucleation on Si

(3) Adams, D P a Mayer, T M a Swartzentruber, B S a

a SANDIA NATIONAL LABORATORIES (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0342729685 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.367256 Document Type: Article

Times cited : (8)

References (40)

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