Selective nanoscale growth of titanium on the Si(001) surface using an atomic hydrogen resist

Journal of Applied Physics

Volumn 86, Issue 3, 1999, Pages 1676-1679

  Mitsui, Toshiyuki ^a   Curtis, Rob ^a   Ganz, Eric ^a  

^a University of Minnesota   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FILM GROWTH; HYDROGEN; PASSIVATION; TITANIUM; TITANIUM COMPOUNDS;

ATOMIC HYDROGEN RESISTS; TITANIUM TETRACHLORIDE;

SEMICONDUCTING SILICON;

EID: 0032606964     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.370946     Document Type: Article

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