Towards the atomic-scale fabrication of a silicon-based solid state quantum computer

Surface Science

Volumn 532-535, Issue , 2003, Pages 1209-1218

  Simmons, Michelle Y ^a   Schofield, Steven R ^a   O'Brien, Jeremy L ^a   Curson, Neil J ^a   Oberbeck, Lars ^a   Hallam, T ^a   Clark, Robert G ^a  

^a UNIVERSITY OF NEW SOUTH WALES   (Australia)

Author keywords

Adsorption kinetics; Electrical transport (conductivity, resistivity, mobility, etc.); Molecular beam epitaxy; Phosphine; Scanning tunneling microscopy; Silicon; Solid gas interfaces; Surface diffusion

Indexed keywords

ADSORPTION; COMPUTERS; DOPING (ADDITIVES); MOLECULAR BEAM EPITAXY; PHOSPHORUS; SILICON;

SOLID STATE QUANTUM COMPUTERS;

QUANTUM THEORY;

EID: 0037799833     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(03)00485-0     Document Type: Conference Paper

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